机译:使用旋装玻璃的金属间介电工艺,用于具有SrBi_2Ta_2O_9电容器的铁电存储器件
artners.org;
机译:An investigation on the leakage current and time dependent dielectric breakdown of ferroelectric leadndash;zirconatendash;titanate thin film capacitors for memory device applications
机译:ESD protection under grounded-up bond pads in 0.13 μm eight-level copper metal, fluorinated silicate glass Low-K intermetal dielectric CMOS process technology
机译:Characterization of an N-channel 1T-1C nonvolatile memory cell using ferroelectric SrBi2Ta2O9as the capacitor dielectric