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首页> 外文期刊>Materials science in semiconductor processing >Fabrication of high aspect ratio copper nanowires using supercritical CO2 fluids electroplating technique in AAO template
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Fabrication of high aspect ratio copper nanowires using supercritical CO2 fluids electroplating technique in AAO template

机译:在AAO模板中使用超临界CO2流体电镀技术制备高长径比的铜纳米线

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This study utilizes the supercritical and post-supercritical electroplating technique, to fabricate copper nano-wires inside ultra-high aspect ratio Anodic Aluminum Oxide templates (AAO templates). Comparisons of the electroplating capabilities and results were made between these methods and the more common traditional electroplating techniques. Under identical experimental conditions and on ultra-high aspect ratio AAO template with thickness of 60 gm (aspect ratio of 1:490), it is evident from the results that the supercritical electroplating process has the fastest electroplating velocity of the three processes (similar to 1.33 mu m/min), followed by post-supercritical electroplating (similar to 1 mu m/min) and traditional electroplating is the slowest (similar to 0.67 mu m/min). This study also discusses the electroplating quality of the copper nano-wires. Samples were sliced along the cross-section, and Field Emission Scanning Electron Microscopy (FESEM) was utilized to observe the copper nano-wires. X-Ray Diffraction (XRD) was used to observe that the crystal structures is polycrystalline, and with the use of equations it is determined that grain size will not be severely affected by changes in current density and supercritical pressure in themselves, but instead the different processes do produce an evident change. The grain size achieved with supercritical electroplating is the smallest, followed by the post-supercritical electroplating, and the largest was given by the traditional electroplating process. Through these results it can be proved that supercritical electroplating process indeed provides grain refinement capabilities. The supercritical fluid enabled electroplating process utilized for these experiments does not need addition of any surfactants to aid filling of the structures, but only relies on the intrinsic properties of supercritical fluids to achieve complete filling of nano-holes, and because there are no surfactants, we can achieve higher degree of purity in the copper nano-wires. (C) 2016 Elsevier Ltd. All rights reserved.
机译:这项研究利用超临界和超超临界电镀技术,在超高长宽比阳极氧化铝模板(AAO模板)内制造铜纳米线。比较了这些方法与更常见的传统电镀技术之间的电镀能力和结果。在相同的实验条件下,在厚度为60 gm(纵横比为1:490)的超高长宽比AAO模板上,从结果可以明显看出,超临界电镀工艺的电镀速度是三个工艺中最快的(类似于1.33微米/分钟),其后是超临界电镀(约1微米/分钟),而传统电镀速度最慢(约0.67微米/分钟)。这项研究还讨论了铜纳米线的电镀质量。沿横截面切片样品,并使用场发射扫描电子显微镜(FESEM)观察铜纳米线。使用X射线衍射(XRD)观察到晶体结构是多晶的,并且通过使用等式,可以确定晶粒尺寸不会受到电流密度和超临界压力本身的变化的严重影响,而是不同流程确实产生了明显的变化。通过超临界电镀获得的晶粒尺寸最小,其次是超临界电镀,其次是传统电镀工艺。通过这些结果可以证明,超临界电镀工艺确实提供了晶粒细化能力。用于这些实验的支持超临界流体的电镀工艺不需要添加任何表面活性剂即可帮助填充结构,而仅依靠超临界流体的固有特性即可完全填充纳米孔,并且由于没有表面活性剂,我们可以在铜纳米线中获得更高的纯度。 (C)2016 Elsevier Ltd.保留所有权利。

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