Texture formation of Ti films deposited on (011) [100] single crystal of silicon steel and stainless steel sheets by different ion plating methods

摘要

In order to clarify the difference in the textures of the Ti films made on (011)[100] single crystal of silicon steel and stainless steel sheets, Ti coatings by the hollow cathode discharge (HCD) and electron beam (EB) + radio frequency (RF)methods were made on the surfaces of the polished silicon steel and stainless steel samples. Pole figures of the textures of the Ti and these samples were measured simultaneously using a SSD (solid state detector) auto pole figure apparatus.A {1010}{sub}Ti pole figure of the Ti films deposited on the (011)[100] single crystal of silicon steel by the HCD method showed a dominant {1010} [1210] oriented texture. In contrast, a {1010}Ti pole figure of the Ti films done by the EB + RF methodshowed a weaker texture than that by the RCD.On the other hand, {1010}{sub}Ti pole figures of the Ti films deposited on the stainless steel sheets by the RCD and EB + RF methods showed no preferred orientation.In the scanning electron microscope observation, the three-dimensional surface roughness of the Ti films on the (011)[100] single crystal of silicon steel was slightly smoother than that of the stainless steel sheet.It is considered that, due to the higher ionization by the HCD method than by EB + RF, it was possible for the Ti films to form the dominant {1010} [1210] texture and the smooth surface. Also, it should be noticed that the dominant {1010} [1210] textureof the Ti films was formed preferentially on the surface of the (011)[100] single crystal of silicon steel with a 3.504 between [1210]{sub}Ti and [100]{sub}(Si-steel) atomic distances.