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Characterization of Al/Ti Nano Multilayer as a Jointing Material at the Interface between Cu and Al2O3

机译:Cu / Al2O3界面处作为接合材料的Al / Ti纳米多层膜的表征

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In this paper, a series of Al/Ti multilayers with different modulation periods were used in copper and Al2O3 ceramic diffusion bonding. The reactive multilayer was deposited by DC magnetron sputtering, and the diffusion bonding experiments were performed at 900 degrees C for 10 min with a pressure of 5 MPa. The interfacial joints were inspected by scanning electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDS), X-ray diffraction and tensile shear tests. As a result, no significant metallurgical defect was observed in the microstructures of the joints. The formation of several intermetallic compounds at the interface, such as Cu/Ti eutectic and Al2O3-X center dot TiO compound, has further confirmed the success of Cu-Al2O3 bonding as compared to the Al/Ni nano-multilayers, which use Al/Ti nano-foils as interlayer for diffusion bonding to bring more benefit to the quality of cermet joint.
机译:在本文中,一系列具有不同调制周期的Al / Ti多层膜用于铜和Al2O3陶瓷的扩散结合。通过DC磁控溅射沉积反应性多层,并且在900℃,5MPa的压力下进行扩散结合实验10分钟。通过扫描电子显微镜(SEM),能量色散X射线光谱法(EDS),X射线衍射和拉伸剪切试验来检查界面接头。结果,在接头的微观结构中没有观察到明显的冶金缺陷。与使用Al / Ni的Al / Ni纳米多层膜相比,在界面处形成了几种金属间化合物,例如Cu / Ti共晶和Al2O3-X中心点TiO复合物,进一步证实了Cu-Al2O3键合的成功。 Ti纳米箔作为扩散结合的中间层,对金属陶瓷接头的质量带来更多好处。

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