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Auger spectra induced by 100‐keV Ar+impact on Be, Al, and Si

机译:100连字符;keV Ar+对Be、Al和Si的影响引起的俄歇光谱

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The Auger electron spectrum induced by the impact of 100‐keV Ar+on metallic aluminum is shown to be consistent with the source of Auger electrons being ejected target particles. The principal spectral line has been identified as being due to ejected Al atoms with a single 2pvacancy. Subsidiary peaks are due to ejected atoms and Al+ions with one or two 2pvacancies. The ion‐induced Auger spectrum of silicon is similar. By contrast the spectrum induced by Ar+impact on Be exhibits a rather broad peak characteristic of aK‐shell vacancy and is similar to that induced by the impact of electrons. By considering the lifetime of the BeK‐shell vacancy we conclude that the Auger decay occurs while the Be atoms are either in the solid or interacting with the surface.
机译:100&连字符;keV Ar+撞击金属铝引起的俄歇电子谱与被喷射目标粒子的俄歇电子源一致。主谱线已被确定为由于喷射出的具有单个 2 pvacancy 的 Al 原子。辅助峰是由于喷射的原子和具有一个或两个 2 pvacancy 的 Al+离子。硅的离子&连字符;诱导的俄歇光谱是相似的。相比之下,Ar+撞击Be诱导的光谱表现出相当宽的aK‐壳层空位的峰特征,并且与电子撞击诱导的光谱相似。通过考虑BeK‐壳空位的寿命,我们得出结论,当Be原子在固体中或与表面相互作用时,会发生俄歇衰变。

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