Fundamental and Advanced Technologies: Design and Manufacturing Support Technologies, Materials Technology, Incubation Technology

摘要

In July 2012, Fuji Electric adopted a new brand statement, "Innovating Energy Technology," which reflects its ongoing "pursuit of innovation in electric and thermal energy technology in order to create products that maximize the efficient utilization of energy and to contribute to the creation of responsible and sustainable societies." Underpinning the realization of this goal is design and manufacturing support technology. Design and manufacturing support technology is being developed in close cooperation with the departments that actually develop products. Fuji Electric has newly developed a spectroscopic analysis method based on radiated light and infrared light, and with the addition of various types of microscopic analysis has established comprehensive techniques for analyzing gate oxide interfaces, crystal defects and the like. These techniques have been used in such applications as the development of SiC (silicon carbide) devices, which are currently the focus of attention as next-generation semiconductor devices, and are making positive contributions. Additionally, Fuji Electric aims to increase the efficiency of materials development through using molecular dynamics calculations and first-principle calculations to develop materials design technology for designing resin material structures and additives used in semiconductor interface structures and semiconductor packages. To increase the reliability of semiconductor devices, Fuji Electric has developed micro strain distribution measurement and evaluation technology for the contacts in semiconductor packages. In addition, so that these advances can be applied to improve insulation in semiconductor modules and to increase the breakdown voltage, Fuji Electric has established technology for visualizing partial discharge inside a module, and has clarified the mechanism by which partial discharges are generated.