首页> 外文期刊>Fibers and Polymers >UV Protective Properties of Cotton Fabric Treated with Plasma, UV Absorber, and Reactive Dye
【24h】

UV Protective Properties of Cotton Fabric Treated with Plasma, UV Absorber, and Reactive Dye

机译:等离子,紫外线吸收剂和活性染料处理的棉织物的紫外线防护性能

获取原文
获取原文并翻译 | 示例
           

摘要

The influence of water vapor plasma on the adsorption of UV absorber during the reactive dyeing of bleached and mercerized cotton fabric was examined. Exhaust dyeing of untreated and plasma-treated cotton was performed using a reactive dye Cibarcon Deep Red S-B and a commercial UV absorber Tinofast CEL. Blank dyeing was performed as a control experiment. Fourier transform infrared spectroscopy (FTIR) was used to identify the presence of the UV absorber on the cotton fabric, whereas scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) were used to analyze surface changes of untreated and plasma-treated dyed samples. The CIELAB color values and ultraviolet protection factor (UPF) of the samples were determined spectrophotometrically. Wash and light fastness of samples was performed also. The results reveal that the UPF of cotton increases after UV absorber treatment and that plasma treatment increases the adsorption of UV absorber during dyeing process, especially at higher dye concentrations. The enhanced adsorption of UV absorber onto plasma-treated cotton is the result of the increased concentration of oxygen containing functional groups on the cotton surface after plasma treatment, confirmed by XPS. The UPF of plasma-treated cotton samples is decreased after washing and increased after exposure to xenon light.
机译:研究了水蒸气等离子体对漂白和丝光棉织物的活性染色过程中紫外线吸收剂吸附的影响。使用活性染料Cibarcon Deep Red S-B和市售UV吸收剂Tinofast CEL对未经处理的和经等离子体处理的棉进行染整。进行空白染色作为对照实验。傅里叶变换红外光谱(FTIR)用于鉴定棉织物上是否存在紫外线吸收剂,而扫描电子显微镜(SEM)和X射线光电子能谱(XPS)用于分析未经处理和经等离子体处理的表面变化染色样品。分光光度法测定样品的CIELAB颜色值和紫外线保护因子(UPF)。还进行样品的洗涤和耐光性。结果表明,紫外线吸收剂处理后棉的UPF值增加,而等离子体处理在染色过程中增加了紫外线吸收剂的吸收率,特别是在较高的染料浓度下。 XPS证实,等离子处理后棉表面上含氧官能团的浓度增加,是紫外线吸收剂对等离子处理棉的吸附增强的结果。经等离子体处理的棉样品的UPF在清洗后会降低,而在暴露于氙气下后会升高。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号