Fabrication of New Elements and Devices on the Glass Surface under a Combined Action of Short-Wavelength Radiation and Ion-Exchange Diffusion

摘要

The possibilities for using the photocrystallization diffusion method in combination with low-temperature ion exchange and etching in acid solutions to fabricate devices of integrated optics and optoelectronics on the surface of alkali aluminosilicate glasses are demonstrated.A two-stage low-temperature ion-exchange technique is developed for producing surface crystallized layers with a controlled thickness and configuration.These layers can serve as a photomask on the glass surface in the course of high-temperature ion exchange.Etching of the glasses and crystals on their base in solutions of mineral acids is investigated.A procedure is proposed for preparing the relief structures on the glass surface.