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首页> 外文期刊>Geochimica et Cosmochimica Acta: Journal of the Geochemical Society and the Meteoritical Society >Solubility and solution mechanism of H2O in alkali silicate melts and glasses at high pressure and temperature
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Solubility and solution mechanism of H2O in alkali silicate melts and glasses at high pressure and temperature

机译:高压和高温下水在碱金属硅酸盐熔体和玻璃中的溶解度和溶解机理

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The solubility behavior of H2O in melts in the system Na2O-SiO2-H2O was determined by locating the univariant phase boundary, melt = melt + vapor in the 0.8-2 GPa and 1000degrees-1300degreesC pressure, and temperature range, respectively. The NBO/Si-range of the melts (0.25-1) was chosen to cover that of most natural magmatic liquids. The H2O solubility in melts in the system Na2O-SiO2-H2O (X-H2O) ranges between 18 and 45 mol% (O = 1) with (partial derivativeX(H2O)/partial derivativeP)(T)similar to14-18 mol% H2O/GPa. The (partial derivativeX(H2O)/partial derivativeP)(T) is negatively correlated with NBO/Si (= Na/Si) of the melt. The (partial derivativeX(H2O)/partial derivativeT)(P) is in the -0.03 to +0.05 mol% H2O/degreesC range, and is negatively correlated with NBO/Si. The [partial derivativeX(H2O)/partial derivative(NBO/Si)](P,T) is in the -3 to -8 mol% H2O/(NBO/Si) range. Melts with NBO/Si similar to basaltic liquids (similar to0.6-similar to1.0) show (partial derivativeX(H2O)/partial derivativeT)(P)<0, whereas more polymerized melts exhibit (partial derivativeX(H2O)/partial derivativeT)(P)>0. Complete miscibility between hydrous melt and aqueous fluid occurs in the 0.8-2 GPa pressure range for melts with NBO/Si less than or equal to0.5 at T >1100degreesC. Miscibility occurs at lower pressure the more polymerized the melt. Copyright (C) 2004 Elsevier Ltd.
机译:通过定位单变量相界,熔体=熔体+蒸气在0.8-2 GPa和1000°-1300°C压力以及温度范围内,可以确定H2O在Na2O-SiO2-H2O体系中的熔体中的溶解行为。选择熔体的NBO / Si范围(0.25-1)来覆盖大多数天然岩浆液体的NBO / Si范围。 Na2O-SiO2-H2O(X-H2O)在熔体中的H2O溶解度范围为18至45 mol%(O = 1),其中(偏导数X(H2O)/偏导数P)(T)约为14-18 mol% H2O / GPa。 (偏导数X(H 2 O)/偏导数P)(T)与熔体的NBO / Si(= Na / Si)负相关。 (偏导数X(H 2 O)/偏导数T)(P)在-0.03至+ 0.05mol%H 2 O /℃范围内,并且与NBO / Si负相关。 [偏衍生物X(H 2 O)/偏衍生物(NBO / Si)](P,T)在-3至-8mol%H 2 O /(NBO / Si)范围内。 NBO / Si与玄武质液体相似的熔体(类似于0.6-类似于1.0)显示(偏导数X(H2O)/偏导数T)(P)<0,而聚合程度更高的熔体表现出(偏导数X(H2O)/偏导数微分T)(P)> 0。对于NBO / Si小于或等于0.5的熔体,在T> 1100摄氏度下,含水熔体与水性流体之间的完全混溶发生在0.8-2 GPa压力范围内。熔体在较低的压力下会发生更多的聚合。版权所有(C)2004 Elsevier Ltd.

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