Ultrasoft X-Ray Spectroscopy with Variation of the Electron Excitation Energy as a Method for Analyzing Thin Films and Solid/Solid Interfaces

摘要

The application of ultrasoft X-ray spectroscopy with variation of the electron excitation energy for phase analysis of thin films and phase reactions at solid/solid interfaces is considered. CN_x nanocondensatess obtained by pulsed arc sputtering of graphite in the presence of nitrogen, silicon implanted with hydrogen ions, and Fe—Co silicides fabricated by ion-beam synthesis have been studied.