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首页> 外文期刊>European Physical Journal Plus >Effect of annealing temperature on morphological, structural and optical properties of nanostructured CuO thin film
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Effect of annealing temperature on morphological, structural and optical properties of nanostructured CuO thin film

机译:退火温度对纳米CuO薄膜的形貌,结构和光学性质的影响

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摘要

CuO thin film was grown on a glass substrate by reactive radio frequency (rf) magnetron sputtering. The deposited film was annealed in air at various temperatures for 2 h. The SEM images showed that the grain size increased with rising annealing temperature. The EDX and XRD results revealed that the chemical composition and phase of the polycrystalline film were not affected by the annealing conditions. The optical band gap increased from 2.244 eV to 2.261 eV and then decreased from 2.261 eV to 2.145 eV by the effect of annealing temperature.
机译:通过反应性射频(rf)磁控溅射在玻璃基板上生长CuO薄膜。将沉积的薄膜在空气中于各种温度下退火2小时。 SEM图像表明,晶粒尺寸随着退火温度的升高而增大。 EDX和XRD结果表明,多晶膜的化学组成和相不受退火条件的影响。光学带隙在退火温度的影响下从2.244 eV增加到2.261 eV,然后从2.261 eV减小到2.145 eV。

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