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Size dependent fracture strength and cracking mechanisms in freestanding polycrystalline silicon films with nanoscale thickness

机译:纳米厚度的独立式多晶硅薄膜的尺寸依赖性断裂强度和开裂机理

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摘要

The size dependent fracture strength and fracture mechanisms of polycrystalline silicon films are investigated by analyzing a wide range of specimen lengths and widths with thicknesses equal to 240 and 40 nm. An on-chip method is used to deform the films and to determine the strength. The strength increases with decreasing external surface area. The thinnest films exhibit the lowest strength and a weaker size effect. The crack path changes from transgranular to intergranular with decreasing thickness. These results are related to differences in microstructure and surface roughness characteristics of the films as controlled by the fabrication process and thickness. (C) 2016 Elsevier Ltd. All rights reserved.
机译:通过分析厚度等于240和40 nm的宽范围的样品长度和宽度,研究了多晶硅膜的尺寸依赖性断裂强度和断裂机理。片上方法用于使膜变形并确定强度。强度随着外部表面积的减小而增加。最薄的薄膜表现出最低的强度和较弱的尺寸效应。随着厚度的减小,裂纹路径从沿晶转变为沿晶。这些结果与由制造工艺和厚度控制的薄膜的微观结构和表面粗糙度特征的差异有关。 (C)2016 Elsevier Ltd.保留所有权利。

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