首页> 外文期刊>Electrochimica Acta >Kinetic analysis of electrosorption using fast Fourier transform electrochemical impedance spectroscopy: underpotential deposition of Bi{sup}(3+) in the presence of coadsorbing ClO{sub}4{sup}- on gold
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Kinetic analysis of electrosorption using fast Fourier transform electrochemical impedance spectroscopy: underpotential deposition of Bi{sup}(3+) in the presence of coadsorbing ClO{sub}4{sup}- on gold

机译:使用快速傅里叶变换电化学阻抗谱进行电吸附的动力学分析:在金上共吸附ClO {sub} 4 {sup}-的情况下Bi {sup}(3+)的欠电势沉积

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摘要

We demonstrate a relatively simple method for studying various kinetic aspects of metal electrodeposition in the presence of coadsorbing anions on an electrode surface. This method combines cyclic voltammetry (CV) with fast Fourier transform electrochemical impedance spectroscopy (FFT-EIS), where both steady state and transient behaviors of the interface are probed simultaneously. As a model surface reaction, we use electrodeposition of Bi{sup}(3+) in the presence of (ClO{sub}4){sup}- adsorption from an aqueous solution onto a gold electrode. The voltage range for underpotential deposition (UPD) of Bi{sup}(3+) is determined with potential step (PS) experiments. The voltage dependent UPD coverage of Bi on Au is determined by analyzing the CV data. The relevant kinetic parameters of both Bi{sup}(3+) and (ClO{sub}4){sup}- deposition reactions under the conditions of CV are measured with FFT-EIS, and analyzed using a complex nonlinear least square method. The differences and similarities between the electrosorption characteristics of Bi{sup}(3+) and (ClO{sub}4){sup}- on Au are discussed in terms of these kinetic parameters.
机译:我们展示了一种相对简单的方法,用于研究在电极表面上共吸附阴离子的存在下金属电沉积的各种动力学方面。该方法将循环伏安法(CV)与快速傅里叶变换电化学阻抗谱(FFT-EIS)结合在一起,可同时探测界面的稳态和瞬态行为。作为模型表面反应,我们使用Bi {sup}(3+)在(ClO {sub} 4){sup}-从水溶液吸附到金电极上的存在下进行电沉积。 Bi {sup}(3+)的欠电位沉积(UPD)的电压范围是通过电位阶跃(PS)实验确定的。通过分析CV数据确定Bi在Au上的电压依赖性UPD覆盖率。使用FFT-EIS测量CV条件下Bi {sup}(3+)和(ClO {sub} 4){sup}-沉积反应的相关动力学参数,并使用复杂的非线性最小二乘法进行分析。根据这些动力学参数,讨论了Bi {sup}(3+)和(ClO {sub} 4){sup}-在Au上的电吸附特性的异同。

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