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首页> 外文期刊>Electrochimica Acta >X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the O K-edge
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X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the O K-edge

机译:O K边缘上钨和钼氧化物的电子结构的X射线吸收研究

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摘要

Magnetron sputtered amorphous thin films a -WO_3,a-MoO_3 and doped a Wo_3:Ir have been studied by X-ray absorption spectroscop on the oxygen K-edge in comparison with crystalline oxides as monoclinic m-WO-3,orthorhomibic #alpha#-MoO_3,Cubic Na_(0.6)WO_3layered-type hexagonal h-WO-3 and WO_3centre dot H_2O ,Having variableelectronic and atomic structureThe changes in the XANES ranging 10-15eV above the absorptionedge are interpreted based on the knownband-structure calculateions.The high-energy features are related to themultiple-scattering processes (EXAFS) at the nearest atoms.
机译:通过X射线吸收光谱研究了氧K边缘上的磁控溅射非晶薄膜a -WO_3,a-MoO_3并掺杂了Wo_3:Ir,与单斜晶系m-WO-3,斜方晶体#alpha# -MoO_3,立方Na_(0.6)WO_3层状六边形h-WO-3和WO_3中心点H_2O,具有可变的电子和原子结构根据已知的能带结构计算,可以解释XANES在吸收边缘以上10-15eV范围内的变化。能量特征与最接近原子的多重散射过程(EXAFS)有关。

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