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CoFeRh alloys - Part 2. Electrodeposition of CoFeRh alloys with high saturation magnetic flux density and high corrosion resistance

机译:CoFeRh合金-第2部分。具有高饱和磁通密度和高耐腐蚀性的CoFeRh合金的电沉积

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摘要

A Co{sub}38Fe{sub}61Rh{sub}1 alloy with high saturation magnetic flux density, Bs, of 2.4T was produced by electrodeposition from a solution containing RhCl{sub}3, NH{sub}4Cl, H{sub}3BO{sub}3, CoSO{sub}4, FeSO{sub}4, saccharin, NaLS (Na-lauryl sulfate) at pH 2.0. This alloy showed excellent corrosion resistance, which was comparable to sputtered 2.4T Co{sub}40Fe{sub}60 alloy. It has been demonstrated that CoFeRh films with Bs = 2.3-2.4T can be obtained at lower current density and lower concentration of RhCl{sub}3 in the plating solution. The increase of current density and RhCl{sub}3 concentration brings about increase of Rh-content in CoFeRh films with higher corrosion resistance, but lower Bs value. The co-electrodeposition of Co and Fe at the controlled potential occurs at more positive potentials (-0.6 to -0.8 V vs. SCE) in the presence of RhCb in the plating solution. This phenomenon is possibly driven by the negative enthalpy of CoFeRh formation and/or through induced co-deposition of CoFeRh from a mixed-metal complex as an electroactive intermediate. It is also demonstrated that the decrease of the Bs value of CoFeRh alloys from 2.4 to 1.2 T is linked to the increase of nonmagnetic elements, i.e. Rh, O, H, S, C, N, and Cl, in the CoFeRh deposit.
机译:通过电沉积含RhCl {sub} 3,NH {sub} 4Cl,H {sub的溶液,制备出具有2.4T高饱和磁通密度Bs的Co {sub} 38Fe {sub} 61Rh {sub} 1合金。 } 3BO {sub} 3,CoSO {sub} 4,FeSO {sub} 4,糖精,NaLS(Na月桂基硫酸钠)在pH 2.0下。该合金显示出优异的耐腐蚀性,可与溅射的2.4T Co {sub} 40Fe {sub} 60合金相媲美。已经证明,在较低的电流密度和较低的镀液中RhCl {sub} 3的浓度下,可以获得Bs = 2.3-2.4T的CoFeRh膜。电流密度和RhCl {sub} 3浓度的增加导致CoFeRh膜中Rh含量增加,具有较高的耐蚀性,但Bs值较低。在电镀液中存在RhCb的情况下,Co和Fe在受控电势下的共电沉积在更多的正电势下(相对于SCE为-0.6至-0.8 V)。该现象可能是由于CoFeRh形成的负焓和/或通过从作为电活性中间体的混合金属配合物中诱导CoFeRh的共沉积而引起的。还证明了CoFeRh合金的Bs值从2.4T降低到1.2T与CoFeRh沉积物中非磁性元素即Rh,O,H,S,C,N和Cl的增加有关。

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