Proposal of Next-Generation Three-Dimensional X-Ray Lithography and Its Application to Fabrication of a High-Luminescence Optical Waveguide for a Liquid Crystal Backlight Unit

摘要

We have developed a new 3D X-ray lithography system for LIGA processing using synchrotron radiation at the New SUBARU facility of the University of Hyogo. The X-ray lithography system can utilize two different energy regions; one is a high-energy region from 3 keV to 10 keV, and the other is a low-energy region from 0.1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. It is demonstrated that a large-area high-luminance 7-inch optical waveguide for the liquid crystal backlight unit was successfully fabricated with this X-ray lithography method.