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首页> 外文期刊>IEEE Transactions on Microwave Theory and Techniques >Gain Boosting in Distributed Amplifiers for Close-to-f(max) Operation in Silicon
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Gain Boosting in Distributed Amplifiers for Close-to-f(max) Operation in Silicon

机译:分布式放大器的增益提升,可在硅片中实现接近f(max)的工作

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摘要

In this paper, the challenges of designing distributed amplifiers at frequencies close to f(max) of transistors are tackled. By using bandpass transmission lines, the maximum operation frequency of the distributed amplifier is increased compared to low-pass transmission lines. Moreover, a novel gain-boosted cascode structure with an internal feedback is employed to cancel a part of the loss in the input line and boost the bandwidth and the highest operation frequency of the amplifier. The proposed amplifier operates up to frequencies as high as 0.67 f(max) of the transistors. Two proof-of-concept prototypes are fabricated in a 0.13-mu m SiGe process with f(max) of 210 GHz. The first prototype shows an average gain of 14.4 dB from 52 to 142 GHz (bandwidth of 90 GHz at the center frequency of 97 GHz) while the second one achieves an average gain of 18.6 dB from 48 to 135 GHz (bandwidth of 87 GHz at the center frequency of 91.5 GHz).
机译:本文探讨了在接近晶体管f(max)的频率下设计分布式放大器的挑战。通过使用带通传输线,与低通传输线相比,分布式放大器的最大工作频率更高。此外,该器件还采用了一种具有内部反馈的新型增益增强级共栅结构,以消除输入线路中的部分损耗,并提高放大器的带宽和最高工作频率。所提出的放大器的工作频率高达晶体管的0.67 f(max)。两个概念验证原型采用0.13 μ m SiGe工艺制造,f(max)为210 GHz。第一个原型在52至142 GHz(中心频率为97 GHz时带宽为90 GHz)的平均增益为14.4 dB,而第二个原型在48至135 GHz(中心频率为91.5 GHz时带宽为87 GHz)的平均增益为18.6 dB。

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