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Concurrent atomistic-continuum simulations of dislocation-void interactions in fcc crystals

机译:fcc晶体中位错-空隙相互作用的并发原子连续谱模拟

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Dislocation interactions with distributed condensed vacancy clusters in fcc metals were simulated via a concurrent atomistic-continuum method. Due to void strengthening, the dislocation lines are found to bow as a result of pinning on the original glide plane and undergo depinning through drawing out screw dipoles and forming prismatic loops on the secondary slip plane. We discovered an inertia-induced transition between Hirsch looping and void shearing mechanisms as the void spacing ranges from the scale of nm to hundreds of nm. Contrary to prior understanding, simulations suggest that large voids nm in diameter) can behave as weak barriers to dislocation motions under high strain-rate dynamic conditions. (C) 2014 Elsevier Ltd. All rights reserved.
机译:通过并发原子连续谱法模拟了fcc金属中分布的空位簇与位错的相互作用。由于空隙的加强,发现位错线由于钉扎在原始滑行平面上而弯曲,并通过拉出螺旋偶极子并在次滑移平面上形成棱形环而脱钉。我们发现了Hirsch循环和孔隙剪切机制之间的惯性诱导跃迁,因为孔隙间距的范围从nm到数百nm。与先前的理解相反,模拟表明,在高应变速率动态条件下,大的孔直径(nm)可以作为位错运动的弱势垒。 (C)2014 Elsevier Ltd.保留所有权利。

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