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首页> 外文期刊>International Biodeterioration & Biodegradation >Topochemical investigation of early stages of lignin modification within individual cell wall layers of Scots pine (Pinus sylvestris L.) sapwood infected by the brown-rot fungus Antrodia vaillantii (DC.: Fr.) Ryv.
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Topochemical investigation of early stages of lignin modification within individual cell wall layers of Scots pine (Pinus sylvestris L.) sapwood infected by the brown-rot fungus Antrodia vaillantii (DC.: Fr.) Ryv.

机译:褐腐真菌 Antrodia vaillantii (DC .: DC)感染的苏格兰松(Sinves sylvestris L.)边材的单个细胞壁层中木质素修饰的早期阶段的拓扑化学研究神父)

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The initiation and progress of wood degradation of Pinus sylvestris sapwood exposed to the brown-rot fungus Antrodia vaillantii was studied on a cellular level by scanning UV microspectrophotometry (UMSP 80, Zeiss, MSP 800 Spectralytics). This improved analytical technique enables direct imaging of lignin modification within individual cell wall layers. The topochemical analyses were supplemented by light and transmission electron microscopy (TEM) studies in order to characterize morphological changes during the first days of degradation. Small wood blocks (1.5x1.5x5 mm) of Scots pine (P. sylvestris) were exposed to fungal decay by A. vaillantii for 3, 7, 11, 16, and 22 days. No significant weight loss was determined in the initial decay periods within three up to 7 days. After three days of decay the topochemical investigation revealed that the lignin modification starts at the outermost part of the secondary wall layer, especially in the region of the latewood tracheids. During advanced degradation after exposure of 22 days, lignin modification occurs non-homogeneously throughout the tissue. Even among the significantly damaged cells, some apparently unmodified cells still exist. Knowledge about lignin modification at initial stages of wood degradation is of fundamental importance to provide more information on the progress of brown-rot decay.
机译:通过扫描紫外显微分光光度法(UMSP 80,Zeiss,1988),在细胞水平上研究了暴露于棕腐真菌樟芝(Antrodia vaillantii)的樟子松边材木材降解的起始和进展。 MSP 800光谱分析仪)。这种改进的分析技术能够对单个细胞壁层内的木质素修饰进行直接成像。拓扑化学分析通过光和透射电子显微镜(TEM)研究得到补充,以表征降解初期的形态变化。樟子松( P。sylvestris )的小木块(1.5x1.5x5 mm)通过 A暴露于真菌腐烂。 vaillantii 持续3、7、11、16和22天。在三至七天内的初始衰变期中未发现明显的体重减轻。腐烂三天后,拓扑化学研究表明,木质素修饰始于次生壁层的最外层,特别是在晚木气管的区域。在暴露22天后进行高级降解期间,木质素修饰在整个组织中均不均匀发生。即使在严重受损的细胞中,仍然存在一些明显未修饰的细胞。关于木材降解初期木质素修饰的知识对于提供有关褐腐病腐烂进展的更多信息至关重要。

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