Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

摘要

Inherent chemical hazards in atomic layer deposition (ALD) processes can be mitigated significantly by careful selection of precursor materials. This work describes the effect of silane (SiH_4) exposure on tungsten ALD growth when the silane is heavily diluted (2 at.-) in argon. A wide ALD temperature window from 200 to ~300℃ is identified, exhibiting a growth rate of between 5 and 6? per ALD cycle using SiH_4 and tungsten hexafluoride (WF6) exposures of ~6×10~5 and ~5×10~5 Langmuirs (L), respectively. For deposition at lower temperature (150℃), growth rates of ~4.5 ? per cycle are obtained using a silane exposure of 30 s per cycle, where the partial pressure of silane at the inlet is controlled at 40 mTorr (corresponding to 1.2×10~6 L of silane). Compositional analysis by secondary ion mass spectroscopy (SIMS) and Auger electron spectroscopy (AES) show less than ~5 at.- Si in theWfilms, with the smallest Si content in films deposited at 300℃. We also describe effects of hot-wall reactor preconditioning on film growth. We conclude that the dilute silane co-reactant offers an alternative to the common disilane, borosilane, or undiluted silane precursors, allowing well-controlled W deposition at 150℃.