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首页> 外文期刊>British Corrosion Journal >Electrochemical simulation of vapour side corrosion of Cu-Ni condenser tubes in multistage flash evaporation distillers
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Electrochemical simulation of vapour side corrosion of Cu-Ni condenser tubes in multistage flash evaporation distillers

机译:多级闪蒸蒸馏器中Cu-Ni冷凝器管气相腐蚀的电化学模拟

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The corrosion of 70-30 Cu-Ni condenser tubes in the vapour of multistage flash evaporation distillers occurs within a thin water film adhering to the metal surface. This, together with the fact that corrosion involves the alternate formation and dissolution of copper oxides, justifies the application of electrochemical techniques in aqueous solutions for the study of vapour side corrosion. Open circuit potential (OCP) transients were used to establish the effects of vacuum and of O_2, CO_2, and mixtures thereof on the corrosion process. The study was carried out in 4 percent Na_2SO_4 solution at ambient temperatures. The state of vacuum in the distiller was simulated by purging the solution with N_2 gas. The OCP of the working electrode tended towards more negative values, revealing the instability of the air formed oxide. This changed slowly to a Cu_2O film. Introduction of O_2 into the cell resulted in the instantaneous shift of potential towards less negative values. Cuprous oxide was oxidised to hydrated cupric oxide. Reintroduction of N_2 gave rise to a clear potential step related to the slow decomposition of Cu(OH)_2 to fresh Cu_2O. The latter oxide thickened with time. Flushing of the solution with CO_2, following deaeration, also caused the OCP to change to more positive values. The change was, however a result of the solution turning acid, causing slow attack on Cu_2O. This was gleaned from the results of N_2 purging, in which a gradual, linear decrease of potential to the Cu_2O value occurred. A 1:1 mixture of O_2 and CO_2 caused the OCP of the electrode to move in the positive direction. Both Cu_2O and Cu(OH)_2 dissolved in the acid solution. Introduction of N_2 caused the OCP to shift to the Cu/Cu_2O potential. This stage was, however short lived and the potential moved once more towards less negative values. This behaviour is attributed to the occurrence of the autocatalytic reaction Cu~(2+) + Cu = 2Cu~(+). The conclusion finds support in the results of a second cycle, in which the potential fluctuated between those of oxide formation and metal dissolution. Comparison is made between the results of corrosion in aqueous solutions and in the vapour phase. Open circuit potential measurements in solution confirmed and extended the results of weight loss determinations in the vapour phase.
机译:多级闪蒸蒸馏器的蒸气中70-30 Cu-Ni冷凝管的腐蚀发生在附着于金属表面的薄水膜内。加上腐蚀涉及到氧化铜的交替形成和溶解这一事实,证明了电化学技术在水溶液中用于研究蒸气侧腐蚀的合理性。开路电势(OCP)瞬变用于确定真空以及O_2,CO_2及其混合物对腐蚀过程的影响。该研究是在环境温度为4%的Na_2SO_4溶液中进行的。通过用N_2气体吹扫溶液来模拟蒸馏器中的真空状态。工作电极的OCP趋向于更大的负值,这表明了空气形成的氧化物的不稳定性。这慢慢变成了Cu_2O膜。将O_2引入电池会导致电势向负值瞬时转移。氧化亚铜被氧化为水合氧化铜。 N_2的重新引入产生了一个明显的潜在步骤,该步骤与Cu(OH)_2缓慢分解为新鲜的Cu_2O有关。后者的氧化物随时间增稠。脱气后用CO_2冲洗溶液也使OCP变为更正值。但是,变化是由于溶液变成酸性,导致对Cu_2O的缓慢侵蚀。这是从N_2吹扫的结果中收集到的,在该结果中,电位逐渐降低至Cu_2O值呈线性下降。 O_2和CO_2的1:1混合物导致电极的OCP向正方向移动。 Cu_2O和Cu(OH)_2均溶解在酸性溶液中。 N_2的引入导致OCP转移到Cu / Cu_2O电位。然而,这个阶段是短暂的,潜力再次朝着较小的负值方向发展。此行为归因于自催化反应Cu〜(2+)+ Cu = 2Cu〜(+)的发生。该结论在第二个循环的结果中得到支持,在第二个循环中,电势在氧化物形成和金属溶解之间波动。比较水溶液和气相中的腐蚀结果。溶液中的开路电势测量证实并扩展了气相中重量损失测定的结果。

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