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首页> 外文期刊>Nanoscale >Solution processed, vertically stacked hetero-structured diodes based on liquid-exfoliated WS2 nanosheets: from electrode-limited to bulk-limited behavior
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Solution processed, vertically stacked hetero-structured diodes based on liquid-exfoliated WS2 nanosheets: from electrode-limited to bulk-limited behavior

机译:基于液体剥离WS2纳米片的溶液处理、垂直堆叠异质结构二极管:从电极限制到体积限制行为

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摘要

Vertically stacked metal–semiconductor-metal heterostructures, based on liquid-processed nanomaterials, hold great potential for various printed electronic applications. Here we describe the fabrication of such devices by spray-coating semiconducting tungsten disulfide (WS2) nanosheets onto indium tin oxide (ITO) bottom electrodes, followed by spraying single-walled carbon nanotubes (SWNTs) as the top electrode. Depending on the formulation of the SWNTs ink, we could fabricate either Ohmic or Schottky contacts at the WS2/SWNTs interface. Using isopropanol-dispersed SWNTs led to Ohmic contacts and bulk-limited devices, characterized by out-of-plane conductivities of ∼10−4 S m−1. However, when aqueous SWNTs inks were used, rectification was observed, due to the formation of a doping-induced Schottky barrier at the WS2/SWNTs interface. For thin WS2 layers, such devices were characterized by a barrier height of ∼0.56 eV. However, increasing the WS2 film thickness led to increased series resistance, leading to a change-over from electrode-limited to bulk-limited behavior at a transition thickness of ∼2.6 μm. This work demonstrates that Ohmic/Schottky behavior is tunable and lays the foundation for fabricating large-area 2D nanosheet-based solution-deposited devices and stacks.
机译:垂直堆叠metal-semiconductor-metal异质结构,基于liquid-processed纳米材料,各种潜力巨大印刷电子应用程序。喷涂等设备的制造半导体二硫化钨(WS2)nanosheets在氧化铟锡(ITO)底部电极,其次是喷洒单壁碳纳米管(纳米)作为电极。根据纳米油墨的配方,我们可以制造电阻或肖特基接触吗在二硫化钨/纳米界面。isopropanol-dispersed并导致欧姆接触和bulk-limited设备,其特点是平面外导率∼10−4 S m−1。然而,当水纳米油墨被使用,精馏是观察到,由于形成doping-induced肖特基势垒的二硫化钨/纳米界面。设备被势垒高度的特点∼0.56 eV。厚度导致增加串联电阻,导致从electrode-limited转换在一个过渡bulk-limited行为厚度∼2.6μm。欧姆/肖特基的行为是可调,奠定了制造大面积2 d的基础nanosheet-based solution-deposited设备和堆栈。

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