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A colloidal route to semiconducting tungsten disulfide nanosheets with monolayer thickness

机译:一种单层厚度半导体二硫化钨纳米片的胶体途径

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摘要

Transition metal dichalcogenides (TMDs) are a class of materials that have been extensively studied in the last decade, with molybdenum disulfide (MoS2) being the main protagonist. Typically, the interesting TMD properties, e.g. a direct band gap transition, or broken inversion symmetry, are only present in monolayer thick TMDs, and in the absence of strong lateral confinement, we require different materials or alloys thereof when we want to obtain TMDs with varying (direct) band gap energies. With this in mind, tungsten disulfide (WS2) is emerging as a direct competitor of MoS2 due to its similar properties but larger band gap energy. While several colloidal strategies have been reported for the synthesis of WS2, the synthesis of monolayer WS2 and detailed studies on the effect of synthesis parameters on the synthesis outcome have remained elusive. In this work we therefore focused on a colloidal synthesis method for monolayer WS2 using a design of experiment (DOE) approach. After optimization, we obtained nanosheets with a band gap transition consistent with the expected value for a monolayer. The thickness was further confirmed by Raman spectroscopy. While we could identify two temperature ranges where we could obtain a monolayer, sample characterization by XPS spectroscopy revealed the presence of different ratios of the metallic phase, with the sample synthesized at lower temperature displaying a lower concentration of the metallic phase.
机译:过渡金属dichalcogenides (tmd)类广泛的材料研究了在过去的十年中,钼二硫(监理)扮演了主要角色。通常,有趣的TMD属性,如直接带隙过渡,或破碎的反演对称,只存在于单层厚战区导弹防御系统,缺乏强有力的外侧监禁,我们需要不同的材料或合金、当我们想获得tmd(直接)不同带隙能量。看来,二硫化钨(WS2)正成为一个直接竞争对手的二硫化钼由于其相似但更大的带隙能量属性。几个胶体策略已报告二硫化钨的合成,合成的单层二硫化钨和详细的研究效果合成参数对合成的结果仍然难以捉摸。专注于胶体合成方法单层WS2使用实验设计(DOE)的方法。与带隙nanosheets过渡一致单层的期望值。厚度进一步证实了喇曼光谱学。温度范围,我们可以获得一个单层,样品由XPS表征光谱显示不同的存在金属相的比例,与样品较低的合成温度显示低浓度的金属相。

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