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Post-annealing optimization of the heteroepitaxial La-doped SrSnO3 integrated on silicon via ALD

机译:通过原子层沉积(ALD)对集成在硅上的异质外延La掺杂SrSnO3进行退火后优化

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摘要

Wide band gap(WBG)alkaline-earth stannate transparent oxide semiconductors(TOSs)have attracted increasing attention in recent years for their high carrier mobility and outstanding optoelectronic properties,and have been applied widely in various devices,such as flat-panel displays.Most alkaline-earth stannates are grown by molecular beam epitaxy(MBE);there are some intractable issues with the tin source including the volatility with SnO and Sn sources and the decomposition of the SnO2 source.In contrast,atomic layer deposition(ALD)serves as an ideal technique for the growth of complex stannate perovskites with precise stoichiometry control and tunable thickness at the atomic scale.Herein,we report the La-SrSnO3/BaTiO3 perovskite heterostructure heterogeneously integrated on Si(001),which uses ALD-grown La-doped SrSnO3(LSSO)as a channel material and MBE-grown BaTiO3(BTO)as a dielectric material.The reflective high-energy electron diffraction and X-ray diffraction results indicate the crystallinity of each epitaxial layer with a full width at half maximum(FWHM)of 0.62°.In situ X-ray photoelectron spectroscopy results confirm that there was no Sn0 state in ALD-deposited LSSO.Besides,we report a strategy for the post-treatment of LSSO/BTO perovskite heterostructures by controlling the oxygen annealing temperature and time,with a maximum oxide capacitance C_(ox)of 0.31 μF cm-2 and a minimum low-frequency dispersion for the devices with 7 h oxygen annealing at 400 ℃.The enhancement of capacitance properties is primarily attributed to a decrease of oxygen vacancies in the films and interface defects in the heterostructure interfaces during an additional ex situ excess oxygen annealing.This work expands current optimization methods for reducing defects in epitaxial LSSO/BTO perovskite heterostructures and shows that excess oxygen annealing is a powerful tool for enhancing the capacitance properties of LSSO/BTO heterostructures.
机译:宽的带隙(银行)锡酸碱土透明氧化物半导体(抛)近年来吸引了越来越多的关注高载流子迁移率和突出光电特性,应用了广泛在各种设备,如平板显示器。分子束外延(MBE);有一些与锡源包括棘手的问题波动性与SnO Sn和来源分解的SnO2来源。相反,原子层沉积(ALD)作为复杂的生长的理想技术锡酸钙钛矿与精确的化学计量学控制和可调厚度在原子规模。钙钛矿异质结构不均匀集成在Si(001),它使用ALD-grownLa-doped SrSnO3 (LSSO)作为材料和频道MBE-grown钛酸钡介电材料(BTO)。反射高能电子衍射和x射线衍射结果表明与完整的结晶度的外延层最大宽度的一半(应用)的0.62°。光电子能谱结果确认没有在ALD-deposited Sn0状态LSSO。后处理LSSO / BTO钙钛矿异质结构通过控制氧气退火温度和时间的最大值氧化物电容C_(牛)为0.31μF cm-2和最低低频分散设备用7 h氧气退火在400℃。增强的电容性能主要归因于减少氧气空缺的电影和界面缺陷在一个异质结构界面额外的非原位过剩氧退火。工作扩大当前的优化方法减少缺陷外延LSSO / BTO钙钛矿异质结构,表明过量的氧气退火是一种增强的有力工具LSSO / BTO的电容特性异质结构。

著录项

  • 来源
    《Nanoscale》 |2023年第21期|9432-9439|共8页
  • 作者

    Yu Zhang; Shen Hu; Pei-Yu Chen;

  • 作者单位

    School of Microelectronics,Fudan University,Shanghai 200433,China;

    Department of Chemical Engineering,The University of Texas at Austin,Austin,Texas 78712,USA;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 分子物理学、原子物理学;
  • 关键词

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