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机译:通过原子层沉积(ALD)对集成在硅上的异质外延La掺杂SrSnO3进行退火后优化
School of Microelectronics,Fudan University,Shanghai 200433,China;
Department of Chemical Engineering,The University of Texas at Austin,Austin,Texas 78712,USA;
机译:La-Doped Srsno3薄膜绝缘子 - 金属过渡的静电控制
机译:Integrated Devices for Photoelectrochemical Water Splitting Using Adapted Silicon Based Multi-Junction Solar Cells Protected by ALD TiO2 Coatings
机译:Simulation of initial stage of silicon cluster formation during post-annealing of memristive structures based on silicon oxide films subjected to Si~+ implantation
机译:孔隙和沟槽设计中Si-Integrated UltraHigh-Lighigh-密度去耦电容器的ALD选项
机译:a balanced calibration of water quantity and quality by multi-objective optimization for integrated water system model