...
首页> 外文期刊>Applied optics >Optical characterization of a compact multilayer-mirror polarimeter in the extreme-ultraviolet range
【24h】

Optical characterization of a compact multilayer-mirror polarimeter in the extreme-ultraviolet range

机译:紧凑型多层镜旋光仪在极紫外范围内的光学特性

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

A molybdenum-silicon (Mo/Si) multilayer-mirror (MLM) polarimeter has been constructed and used to analyze the extreme-ultraviolet (EUV) emission from excited HeI and HeII states folIowing electron impact on He for wavelengths ranging from approximately 256 to 584 A Aratio ofreflectivities for sand p-polarized light, R_(s)R_(p) ~ 10, and a resolving power of λ/△λ≈ 6 at 304 A were obtained. These characteristics and the use of a VYNS (a copolymer material composed of 90% vinyl chloride and 10% vinyl acetate) spectral filter were sufficient to allow a detailed polarization study of the first two members of the Lyman series of He~(+) at wavelengths of 304 A (Hell 2_(p) → 1s) and 256 A (Hell 3p → 1s) for impact-electron energies ranging from threshold to 1500 eV. The MLM has also been used as a single flat-surface mirror polarimeter for the analysis of longer-wavelength radiation (517 to 584 A) from the (lsnp) ~(1)P ° → (ls~(2)) ~(1)S series of neutral He with R_(s)/R_(p) ≈ 3. Although MLM polarimeters were previously used for EUV measurements with bright photon sources such as those provided, by synchrotron facilities, the results presented clearly demonstrate the feasibility of such devices with lowerintensity electron and ion impact sources. The compact design of the apparatus makes it suitable as a portable measurement and calibration device.
机译:构造了钼硅(Mo / Si)多层镜(MLM)旋光计,并用于分析电子对He的影响(波长范围约为256至584)后,激发HeI和HeII态的极紫外(EUV)发射得到了沙p偏振光的反射率R_(s)R_(p)〜10,在304 A时的分辨力为λ/△λ≈6。这些特性以及使用VYNS(由90%的氯乙烯和10%的乙酸乙烯酯组成的共聚物材料)光谱滤光片足以对He〜(+)的Lyman系列的前两个成员进行详细的极化研究。冲击电子能量的阈值至1500 eV范围分别为304 A(Hell 2_(p)→1s)和256 A(Hell 3p→1s)。 MLM还已用作单个平面镜旋光计,用于分析(lsnp)〜(1)P°→(ls〜(2))〜(1的较长波长辐射(517至584 A) )S系列中性He,R_(s)/ R_(p)≈3。尽管MLM偏振计以前曾用于通过同步加速器设施提供的明亮光子源进行EUV测量,但给出的结果清楚地证明了这种方法的可行性。具有较低强度电子和离子冲击源的设备。该设备的紧凑设计使其适合用作便携式测量和校准设备。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号