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机译:化学-机械抛光的原位研究通过模拟行为蓝宝石上(0001)通过AFM-tapping化学产物除去过程模式在两种液体和空气环境
Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China;
Sapphire; Atomic Force Microscopy; air environmentsimulatingliquids;
机译:Chemical-mechanical polishing performance of core-shell structured polystyrene@ceria/nanodiamond ternary abrasives on sapphire wafer
机译:Investigation on nanoscale material removal process of BK7 and fused silica glass during chemical-mechanical polishing
机译:(044004)Effect of Particle Size Distribution, pH, and Na~+ Concentration on the Chemical Mechanical Polishing of Sapphire and 4H-SiC (0001)