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Strain-induced structural defects and their effects on the electrochemical performances of silicon core/germanium shell nanowire heterostructures

机译:应变及其结构性缺陷对电化学性能的影响核心/硅锗纳米线异质结构

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摘要

We report on strain-induced structural defect formation in core Si nanowires of a Si/Ge core/shell nanowire heterostructure and the influence of the structural defects on the electrochemical performances in lithium-ion battery anodes based on Si/Ge core/shell nanowire heterostructures. The induced structural defects consisting of stacking faults and dislocations in the core Si nanowire were observed for the first time. The generation of stacking faults in the Si/Ge core/shell nanowire heterostructure is observed to prefer settling in either only the Ge shell region or in both the Ge shell and Si core regions and is associated with the increase of the shell volume fraction. The relaxation of the misfit strain in the [112] oriented core/shell nanowire heterostructure leads to subsequent gliding of Shockley partial dislocations, preferentially forming the twins. The observation of crossover of defect formation is of great importance for understanding heteroepitaxy in radial heterostructures at the nanoscale and for building three dimensional heterostructures for the various applications. Furthermore, the effect of the defect formation on the nanomaterial's functionality is investigated using electrochemical performance tests. The Si/Ge core/ shell nanowire heterostructures enhance the gravimetric capacity of lithium ion battery anodes under fast charging/discharging rates compared to Si nanowires. However, the induced structural defects hamper lithiation of the Si/Ge core/shell nanowire heterostructure.
机译:我们报道了应变的结构性缺陷形成核心的硅/锗硅纳米线核/壳纳米线异质结和影响的结构性缺陷在锂离子电池电化学性能电池阳极基于Si /通用核/壳纳米线异质结构。由堆积层错和混乱核心的硅纳米线是第一时间。硅/锗核/壳纳米线异质结构只观察到喜欢定居在通用电气壳牌地区或在通用电气外壳和Si的核心地区和与的增加有关壳体积分数。不适应环境的应变在面向[112]核/壳纳米线异质结构导致后续滑翔的肖克利部分混乱,优先形成了双胞胎。交叉的缺陷形成的理解异质外延的重要性在纳米尺度和径向异质结构建筑三维异质结构不同的应用程序。的缺陷对纳米材料的形成功能是调查使用电化学性能测试。核/壳纳米线异质结构增强重量的锂离子电池阳极在快速充电/放电率而硅纳米线。结构性缺陷阻碍lithiation Si /通用电气核/壳纳米线异质结构。

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