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An Fe-doped ZnO/BiVO(4)heterostructure-based large area, flexible, high-performance broadband photodetector with an ultrahigh quantum yield

机译:一个Fe-doped氧化锌/ BiVO (4) heterostructure-based大区、灵活、高性能宽带光电探测器超高量子产率

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摘要

Pristine ZnO has been widely explored for its use in UV photodetectors; however, the utility of ZnO in broadband photodetectors is still a challenge as it absorbs in the UV region only with low quantum efficiency and responsivity that can be accredited to the high recombination rate of photo-generated charge carriers. To address this issue, we report an Fe-doped 2D ZnO thin film, obtained through band gap engineering, and a 1D electrospun mixed-inorganic monoclinic BiVO(4)nanofiber heterostructure on an ITO-coated PET substrate-based broadband photodetector (PD) with ultra-high responsivity and EQE values in comparison to PDs fabricated using expensive cleanroom techniques. BiVO(4)plays the dual role of absorbing photons in the visible and NIR regions and creating local electric fields at the interface of the Fe-doped ZnO (FZO)-BiVO(4)heterostructure, which helps in the separation of electron-hole pairs. The robustness of the flexible PD was further examined under the conditions of repeated bending cycles (up to 500), yielding a stable response. The responsivity values obtained for UV, visible and NIR irradiation are 7.35 A W-1, 3.8 A W(-1)and 0.18 A W(-1)with very high EQE values of 2501.7%, 851.2% and 28.3%, respectively. The facile and cost-effective fabrication of the device with high performance provides a new approach for developing flexible electronics and high-performance optoelectronic devices.
机译:因其使用原始氧化锌已被广泛研究在紫外探测器;在宽带光电探测器仍然是一个挑战因为它只吸收紫外线的地区较低量子效率和响应率认证的重组率高photo-generated运营商收费。问题,我们报告一个Fe-doped 2 d氧化锌薄膜,通过带隙工程和1 d实际上电纺mixed-inorganic单斜ITO-coated BiVO(4)纳米纤维异质结构宠物substrate-based宽带光电探测器(PD)超高响应率和EQE值比较使用昂贵的PDs捏造洁净室技术。在可见光和近红外光谱吸收的光子地区和当地电场的创建Fe-doped氧化锌的接口(FZO) -BiVO(4)异质结构,这有助于在电子空穴对的分离。灵活的PD进一步检查了下(条件重复弯曲周期500),产生一个稳定的反应。反应性值获得了紫外线,可见光和近红外光谱辐照w1 7.35, 3.8 W (1)0.18 W(1)高EQE值的2501.7%,分别为851.2%和28.3%。具有成本效益的设备的制造高绩效提供了一种新的方法开发灵活的电子产品和高性能的光电设备。

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