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Crystal engineering and ferroelectricity at the nanoscale in epitaxial 1D manganese oxide on silicon

机译:晶体工程和铁电性在外延1 d纳米锰氧化物硅

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摘要

Ferroelectric oxides have attracted much attention due to their wide range of applications, particularly in electronic devices such as nonvolatile memories and tunnel junctions. As a result, the monolithic integration of these materials into silicon technology and their nanostructuration to develop alternative cost-effective processes are among the central points in the current technology. In this work, we used a chemical route to obtain nanowire thin films of a novel Sr1+delta Mn8O16 (SMO) hollandite-type manganese oxide on silicon. Scanning transmission electron microscopy combined with crystallographic computing reveals a crystal structure comprising hollandite and pyrolusite units sharing the edges of their MnO6 octahedra, resulting in three types of tunnels arranged along the c axis, where the ordering of the Sr atoms produces natural symmetry breaking. The novel structure gives rise to ferroelectricity and piezoelectricity, as revealed by local direct piezoelectric force microscopy measurements, which confirmed the ferroelectric nature of the SMO nanowire thin films at room temperature and showed a piezoelectric coefficient d(33) value of 22 +/- 6 pC N-1. Moreover, we proved that flexible vertical SMO nanowires can be harvested providing an electrical output energy through the piezoelectric effect, showing excellent deformability and high interface recombination. This work indicates the possibility of engineering the integration of 1D manganese oxides on silicon, a step which precedes the production of microelectronic devices.
机译:铁电氧化物已经备受关注由于其广泛的应用,尤其是在电子设备等非易失性记忆和超导隧道结。因此,这些的单片集成电路材料为硅技术和他们的nanostructuration开发替代性成本效益的过程是在中央指出在当前的技术。我们使用一种化学途径获得纳米丝薄电影小说Sr1 +δMn8O16 (SMO)hollandite-type硅锰氧化物。扫描透射电子显微镜结合晶体计算揭示了包括锰钡矿和晶体结构软锰矿单位共享MnO6的边缘正八面体,导致三种类型的隧道沿c轴排列,排序的Sr原子产生自然对称破坏。这部小说结构产生铁电性、压电揭示了当地直接压电力量显微镜测量,证实了SMO的铁电性质纳米丝薄电影在室温和显示压电系数d(33)的价值22 + / - 6所示pC n - 1。可以收获提供垂直SMO纳米线电子通过输出能量压电效应,表现优秀可变形性和较高的界面复合。这项工作表明的可能性工程1 d锰的集成在硅氧化物,它先于一步微电子设备的生产。

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