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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Effect of thermal annealing on some electrical properties and optical band gap of vacuum evaporated Se _(65)Ga _(30)In _5 thin films (Conference Paper)
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Effect of thermal annealing on some electrical properties and optical band gap of vacuum evaporated Se _(65)Ga _(30)In _5 thin films (Conference Paper)

机译:热退火对_5薄膜(会议纸)中真空蒸发的SE _(65)ga _(30)真空蒸发的se _(65)的影响

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摘要

Electrical properties and optical band gap of amorphous Se _(65)Ga _(30)In _5 thin films, which were thermally evaporated onto chemically cleaned glass substrates, have been studied before and after thermal annealing at temperatures above the glass transition temperature and below the crystallization temperature. The I-V characteristics, which were recorded in the temperature range (200-300 K), were obtained at different voltages and exhibit an ohmic and non-ohmic behavior at low (0-5 V) and high (5-18 V) voltages, respectively, for annealed and as-prepared films. Analysis of the experimental data in the high voltage range confirms the presence of space charge limited conduction (SCLC) for annealed and as-prepared films. The dependence of DC conductivity on temperature in the low voltage region shows two types of conduction channels: The first is in the range 270-300 K and the other at the lower temperature range (200-270 K). The conduction in the first region is due to thermally activated process, while in the other is due variable range hopping (VRH) of charge carriers in the band tails of the localized states. After annealing, the conductivity has been found to increase but the activation energy decreases. This is attributed to rupturing of Se-In weak bonds and formation of Se-Ga strong bonds. This process changes the concentration of defects in the films which in turn decreases the density of states N(E _F) as predicted by Mott's VRH model. Analysis of the absorption coefficient of annealed and as-prepared films, in the wavelength range 300-700 nm, reveals the presence of parabolic densities of states at the edges of both valence and conduction bands in the studied films. The optical band gap (E _g) was obtained through the use of Tauc's relation and is found to decrease with annealing temperature.
机译:在_5薄膜中的无定形SE _(65)ga _(30)的电特性和光条间隙,在玻璃过渡温度上方和下方的温度下进行热退火之前,已经研究了在化学清洁的玻璃基板上热蒸发到化学清洁的玻璃基板上结晶温度。在温度范围(200-300 K)中记录的I-V特性在不同的电压下获得,并在低(0-5 V)和高(5-18 V)电压下显示出欧姆和非OHMIC行为,分别用于退火和准备的电影。对高电压范围内的实验数据的分析证实了对退火和制备膜的空间电荷有限传导(SCLC)的存在。低压区域中直流电导率对温度的依赖性显示了两种类型的传导通道:第一个是在270-300 K的范围内,另一个在较低的温度范围(200-270 K)。第一个区域的传导是由于热激活的过程引起的,而另一个区域的传导是由于局部状态的带尾中电荷载体的可变范围跳跃(VRH)。退火后,发现电导率增加,但激活能量降低。这归因于SE-IN弱键破裂和SE-GA强键的形成。该过程改变了膜中缺陷的浓度,从而降低了MOTT VRH模型所预测的状态N(E _F)的密度。在300-700 nm的波长范围内,对退火和制备膜的吸收系数的分析揭示了在研究膜中的价边缘和传统带的边缘的抛物线密度。通过使用TAUC的关系获得光带间隙(E _G),并发现随着退火温度而降低。

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