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Spectroscopic(FTIR and UV-Vis)Analysis,Supramolecular Studies,XRD Structural Characterization and Theoretical Studies of Two Flavone-Oxime Derivatives

机译:光谱学(FTIR和UV-VIS)分析,超分子研究,XRD结构表征和两个黄酮 - 氧气衍生物的理论研究

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Two flavone oxime derivatives,(E)-2-phenyl-4H-chromen-4-one O-(2-bromoallyl)oxime(C~(-18)H~(-14)BrNO2)(1)and(E)-2-phenyl-4Hchromen-4-one O-benzyloxime(C~(-22)H~(-17)NO2)(2),were analyzed by XRD,IR(FT-IR),and UV-Vis spectroscopies.Supramolecular studies of the two compounds revealed the existence of weak C-Br···Cg halogen bonds as well as weak C-H···O interactions in the first oxime derivative and even weaker interactions dominated by dispersion forces in the second derivative.These interactions were further analyzed by observing the Hirshfeld surfaces.To evaluate the features of the halogen interactions,molecular electrostatic studies(MEP)were performed.These studies showed positive charges on the surface of the halogen atom,demonstrating the presence of a"sigma hole".The maximum and minimum values of the molecular electrostatic potential indicate low molecular reactivity,and difficult access of the electrophilic or nucleophilic agents to the molecule,in the case of a hypothetical reaction,is observed.Spectroscopic studies in the IR region showed similar results for the two compounds,finding specific differences in the behavior of the N-O and N=C frequencies that characterize the oxime group.UV–visible spectra of both compounds were also recorded and the electronic properties,such as HOMO,LUMO and band gap energies were measured by time-dependent DFT(TD-DFT)approach.Analysis of the interaction energies of the two compounds between pairs of neighboring molecules within a radius of 3.8 A,using the CrystalExplorer program at the DFT/6-31G level,showed that the E_(dis)term essentially contributed to the total interaction energy in the process of crystal formation.
机译:两个黄酮氧电衍生物,(E)-2-苯基-4H-4H-4H-4-ONE O-(2-溴)氧电(C〜(-18)H〜(-14)BRNO2)(-18)brno2)(1)(1)(1)和(e) -2-苯基-4HCHROMEN-4-ONE O-benzyloxime(C〜(-22)H〜(-17)NO2)(2)(2),通过XRD,IR(FT-IR)和UV-VIS光谱镜分析。两种化合物的超分子研究揭示了弱的C-Br···cg CG卤素键以及弱的c-h···o相互作用在第一氧电衍生物中的相互作用,甚至在第二个衍生物中由分散力支配的较弱的相互作用。通过观察赫希菲尔德表面进一步分析。为了评估卤素相互作用的特征,进行了分子静电研究(MEP)。这些研究表明,卤素原子表面上有正电荷,证明存在“ Sigma孔”。分子静电电位的最大和最小值表明分子反应性低,并且在假设的RECC的情况下,亲电或亲核剂进入分子很难进入分子观察到IR区域的光谱研究对两种化合物显示出相似的结果,发现了表征Oxime grout的N-O和N = C频率的特定差异。通过时间依赖性的DFT(TD-DFT)方法测量电子性能,例如HOMO,LUMO和带隙能。使用3.8 a的半径内的两对相邻分子之间的两种化合物的相互作用能的分析DFT/6-31G水平的CrystaleXplorer程序表明,在晶体形成过程中,E_(DIS)项实质上有助于总相互作用能量。

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