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Effect of Annealing Temperature on Structural and Optical Properties of ZnTiO3 Perovskite Layers Deposited on Silicon for Photocatalytic Applications

机译:退火温度对沉积在硅上的Zntio3钙钛矿层的结构和光学特性的影响

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In this paper, we investigate the effect of annealing temper- ature on structural, optical, and photocatalytic properties of nanostructured ZnTiO3 thin films deposited on Si substrates. ZnTiO3 coatings were prepared by consecutive sol-gel method and further deposited on Si substrates by spin-coating. The obtained films were annealed at three various temperatures namely 700°C, 800°C, and 900°C. X-ray diffraction analysis shows that the crystallite size of the films grows from 100 to 125 nm as the annealing temperature increases from 700 to 900°C. At the same time, the roughness increases from 232 to 289 nm and the band gap dwindles from 3.73 to 3.05 eV. ZnTiO3 coatings annealed at 700°C exhibits the highest photo- degradation rate about 74% to catalyze the degradation of the Methylene Blue aqueous solution. We demonstrate that this high photocatalytic activity is attributed to the structural and optical properties of prepared samples.
机译:在本文中,我们研究了退火回火对沉积在Si底物上的纳米结构Zntio3薄膜的结构,光学和光催化特性的影响。 通过连续的Sol-Gel方法制备ZNTIO3涂层,并通过自旋涂层进一步沉积在Si底物上。 在三种不同的温度下,即700°C,800°C和900°C,将获得的膜退火。 X射线衍射分析表明,随着退火温度从700°C升高,膜的结晶石大小从100 nm生长到125 nm。 同时,粗糙度从232 nm增加到289 nm,带隙从3.73增加到3.05 eV。 在700°C退火的Zntio3涂层表现出最高的光降解速率,约74%,以催化亚甲基蓝水溶液的降解。 我们证明,这种高光催化活性归因于制备样品的结构和光学特性。

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