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首页> 外文期刊>Anti-Corrosion Methods and Materials >Electrochemical impedance spectroscopy (EIS) modelling of different behaviours of Ni and Ni oxide thin films for corrosion prevention in sour media
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Electrochemical impedance spectroscopy (EIS) modelling of different behaviours of Ni and Ni oxide thin films for corrosion prevention in sour media

机译:Ni和Ni氧化物薄膜不同行为的电化学阻抗谱(EIS)模型用于在酸性介质中防止腐蚀

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Purpose - The purpose of this paper is a theoretical modeling use of electrochemical impedance spectroscopy (EIS) technique for different cases that could describe the possible electrochemical behaviour on steel coated with metallic and oxide thin films(of nickel) deposited by magnetron sputtering, and compare them to know if the theoretical analysis resembles the real case. It is extremely important to clarify that such simulations do not consider the use of the constant phase element (CPE) for the analysis. Therefore, the goal for the theoretical models should be to gain acceptance in electrochemical research. Design/methodology/approach - In order to obtain the equivalent circuits to explain the different possible behaviours of the films and their protective properties in sour media, EIS experimental data were correlated with data from the simulation software. The different nickel and nickel oxide thin films were tested after their deposition by magnetron sputtering on low-carbon steel and after they had then been exposed to the sour media electrolyte of NaCl 3 wt% + H_2S (saturated). Findings - The EIS simulation starts from the laboratory evaluation of nickel and nickel oxide thin films as anticorrosive protection for low-carbon steel exposed to sour media. From these results, it is found that the nickel and nickel oxide films could adopt seven different behaviours, and all are possible to occur. Practical implications - The equivalent circuits proposed will give an insight into the corrosion phenomena for different metals coated with thin films and exposed to sour media, because all of the simulations are made on the basis of real EIS results. Originality/value - The electrical analysis in the simulation diagram did not consider the use of the CPE to adjust the plots. In consequence, the values of all parameters for the seven different adjustments obtained through the simulations establish a reference for the explanation of the corrosion phenomena. They are also a tool with which to predict the possible behaviour of a thin film deposited on metal and exposed to electrolytes that are as aggressive as sour media.
机译:目的-本文的目的是在不同情况下使用电化学阻抗谱(EIS)技术进行理论建模,可以描述磁控溅射沉积的金属和氧化物薄膜(镍)涂层的钢上可能的电化学行为,并进行比较他们知道理论分析是否与实际情况相似。澄清此类模拟没有考虑将恒定相位元素(CPE)用于分析非常重要。因此,理论模型的目标应该是在电化学研究中获得认可。设计/方法/方法-为了获得等效电路来解释薄膜在酸性介质中的不同可能行为及其保护性能,将EIS实验数据与仿真软件中的数据相关联。通过磁控溅射在低碳钢上沉积不同的镍和氧化镍薄膜,然后将其暴露于NaCl 3 wt%+ H_2S(饱和)的酸性介质电解质中,进行测试。研究结果-EIS模拟从对镍和氧化镍薄膜的实验室评估开始,作为对暴露于酸性介质的低碳钢的防腐保护。从这些结果,发现镍和氧化镍膜可以采取七种不同的行为,并且都可能发生。实际意义-提议的等效电路将深入了解涂有薄膜并暴露于酸性介质的不同金属的腐蚀现象,因为所有模拟都是基于真实EIS结果进行的。原创性/价值-模拟图中的电气分析未考虑使用CPE来调整图。因此,通过模拟获得的七个不同调整的所有参数的值将为解释腐蚀现象提供参考。它们还是一种工具,可用来预测沉积在金属上并暴露于与酸性介质一样侵蚀性的电解质中的薄膜的可能行为。

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