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Misfit dislocation free InAs/GaSb core-shell nanowires grown by molecular beam epitaxy

机译:与分子束外延生长的不合适脱位无INAS/GASB CORE-SHELL纳米线

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摘要

In this report, we present the growth and structural analyses of broken gap InAs/GaSb core-shell nanowires by molecular beam epitaxy using an Au-free approach. Depending on the shell growth temperature, two distinct growth regimes for the GaSb shells are identified resulting in conformal or tapered shells. Morphological analyses reveal a dodecagonal nanowire cross-section after GaSb shell growth. Detailed transmission electron microscope investigations from different zone axes confirm that the small lattice mismatch of 0.6% allows the deposition of 40 nm thick GaSb shells free of misfit dislocations. Additionally, an abrupt interface from InAs to GaSb is found. These nanowires are suitable for future devices such as TFETs.
机译:在本报告中,我们通过使用无AU方法通过分子束外延对差距INAS/GAP INAS/GAP CORE-SHELL纳米线的生长和结构分析进行了生长和结构分析。 根据壳的生长温度,确定了两个不同的燃气壳生长状态,从而导致共形壳或锥形壳。 形态学分析揭示了燃气壳生长后的十二杆纳米线横截面。 来自不同区域轴的详细透射电子显微镜研究证实,0.6%的小晶格不匹配允许沉积40 nm厚的燃气壳,没有不合适的脱位。 此外,还发现了从INAS到GASB的突然接口。 这些纳米线适合将来的设备,例如TFET。

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