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Humidity effect on peeling of monolayer graphene and hexagonal boron nitride

机译:湿度影响单层石墨烯和六边形氮化物的剥离

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摘要

Ambient humidity introduces water adsorption and intercalation at the surfaces and interfaces of low-dimensional materials. Our extensive molecular dynamics (MD) simulations reveal the completely opposite contributions of interfacial water to the peeling of monolayer graphene and hexagonal boron nitride (h-BN) sheets from graphite and BN substrates. For graphene, interfacial water decreases the peeling force, due to lower adhesion at the graphene/water interface. The peeling force of h-BN increases with an increase in the thickness of interfacial water, owing to stronger adhesion at the h-BN/water interface and the detachment of the water layer from the substrates. In this work, a theoretical model considering graphene/water and water/substrate interfacial adhesion energies is established, to predict the peeling forces of graphene and h-BN, which coincides well with the peeling forces predicted by the MD simulations. Our results should provide a deeper insight into the effect of interfacial water, induced by ambient humidity, on mechanical exfoliation and the transfer of two-dimensional van der Waals crystals.
机译:环境湿度在低维材料的表面和界面引入了水的吸附和嵌入。我们的广泛分子动力学(MD)模拟揭示了界面水对单层石墨烯和六方氮化硼(h-BN)片从石墨和BN衬底剥离的完全相反的贡献。对于石墨烯,界面水降低了剥离力,因为石墨烯/水界面的附着力较低。h-BN的剥离力随着界面水厚度的增加而增加,这是因为h-BN/水界面处的粘附力更强,且水层从基底上分离。在这项工作中,建立了一个考虑石墨烯/水和水/衬底界面粘附能的理论模型,以预测石墨烯和h-BN的剥离力,这与MD模拟预测的剥离力吻合良好。我们的研究结果将对环境湿度引起的界面水对二维范德华晶体的机械剥落和转移的影响提供更深入的了解。

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