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首页> 外文期刊>Nanotechnology >Functionalization of electronic, spin and optical properties of GeSe monolayer by substitutional doping: a first-principles study
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Functionalization of electronic, spin and optical properties of GeSe monolayer by substitutional doping: a first-principles study

机译:因子掺杂Gese Monolayer电子,旋转和光学性质的官能化:第一原理研究

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摘要

Substitutional doping has traditionally been used to modulate the existing properties of semiconductors and introduce new exciting properties, especially in two-dimensional materials. In this work, we have investigated the impact of substitutional doping (using group III, IV, V, and VI dopants) on the structural, electronic, spin, and optical properties of GeSe monolayer by using first-principles calculations based on density functional theory. Our calculated binding energies, formation energies and phonon dispersion curves of the doped systems support their stability and hence the feasibility of physical realization. Our results further suggest that switching between metallic and semiconducting states of GeSe monolayer can be controlled by dopant atoms with a different number of valence electrons. The band gap of the semiconducting structures can be tuned within a range of 0.2864 eV to 1.17 eV by substituting with different dopants. In addition, most of the doped structures maintain the low effective mass, 0.20 m(0) to 0.59 m(0) for electron and 0.21 m(0) to 0.52 m(0) for hole, which ensures the enhanced transport properties of GeSe based electronic devices. Moreover, when Ge is substituted with group V dopants, a magnetic moment is introduced in an otherwise nonmagnetic GeSe monolayer. The optical absorption coefficient of the doped structures can be significantly improved (>2x) in the visible and infrared regions. These intriguing results would encourage the applications of doped GeSe monolayer in next-generation electronic, optoelectronic and spintronic devices.
机译:取代掺杂传统上被用来调节半导体的现有性质,并引入新的激发性质,尤其是在二维材料中。在这项工作中,我们通过基于密度泛函理论的第一性原理计算,研究了置换掺杂(使用III、IV、V和VI族掺杂剂)对GeSe单层膜的结构、电子、自旋和光学性质的影响。我们计算的掺杂系统的结合能、形成能和声子色散曲线支持了它们的稳定性,从而证明了物理实现的可行性。我们的结果进一步表明,GeSe单层膜的金属态和半导体态之间的切换可以由具有不同价电子数的掺杂原子控制。半导体结构的带隙可以在0.2864ev到1.17ev的范围内通过不同的掺杂剂进行调节。此外,大多数掺杂结构保持低有效质量,电子为0.20 m(0)至0.59 m(0),空穴为0.21 m(0)至0.52 m(0),这确保了GeSe基电子器件的增强传输特性。此外,当Ge被V族掺杂剂取代时,磁矩被引入非磁性GeSe单层中。在可见光和红外区域,掺杂结构的光吸收系数可以显著提高(>2x)。这些有趣的结果将鼓励掺杂GeSe单层膜在下一代电子、光电子和自旋电子器件中的应用。

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