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Silicene/ZnI2 van der Waals heterostructure: tunable structural and electronic properties

机译:硅丙烯/ Zni2 van der Wa族异质结构:可调结构和电子性质

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摘要

By utilizing ab initio density functional theory, the structural and electronic properties of novel silicene/ZnI2 heterobilayers (HBLs) were investigated. Constructing HBLs with ZnI2 in different stacking configurations leads to direct bandgap opening of silicene at K point, which ranges from 138.2 to 201.2 meV. By analyzing the projected density of states and charge density distribution, we found that the predicted HBLs conserve the electronic properties of silicene and ZnI2 can serve as a decent substrate. The tunability of electronic properties can be achieved by enforcing biaxial strain and by varying interlayer distance where bandgap can get as low as zero to as high as 318.8 meV and 290.7 meV, respectively depending on the stacking patterns. Maintenance of the remarkable features of silicene, high mobility of charge carriers, and fine-tuning of bandgap pave the way to construct new nanoelectronic devices using these novel silicene/ZnI2 HBLs.
机译:利用从头算密度泛函理论,研究了新型硅烯/ZnI2异质双层膜(HBLs)的结构和电子性质。在不同的堆积结构中用ZnI2构建HBL,导致硅质在K点直接带隙开放,其范围为138.2到201.2 meV。通过分析投影态密度和电荷密度分布,我们发现预测的HBL保留了硅烯的电子性质,ZnI2可以作为一个合适的衬底。电子特性的可调谐性可以通过施加双轴应变和改变层间距离来实现,其中带隙可分别低至0至高达318.8 meV和290.7 meV,具体取决于堆叠模式。硅烯的显著特性、载流子的高迁移率以及带隙的微调为使用这些新型硅烯/ZnI2 HBL构建新的纳米电子器件铺平了道路。

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