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New approach to SnO2-based transparent conducting oxides incorporating synergistic effects of Au nano particles and microwave irradiation

机译:基于SnO2的透明导电氧化物的新方法,其掺入Au纳米颗粒和微波辐射的协同作用

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摘要

Recently, transparent conducting oxides (TCOs) have attracted increasing attention in the development of electronic devices and energy harvesting applications. Standard materials used as TCOs are Sn-doped indium oxide (ITO) and F-doped tin oxide (FTO), which are ternary systems and require a doping process. Here, we introduce the synergistic effect of using microwave (MW) irradiation and Au nanoparticles (NPs) together on tin dioxide (SnO2) thin films grown by atomic layer deposition (ALD), which have a binary system and do not need any additional doping process. For comparison to as-deposited SnO2 thin films, we prepared MW-irradiated SnO2 thin films with and without Au NP decoration. SnO2 thin films with Au NPs added during MW irradiation have carrier concentration, Hall mobility, and resistivity of 1.45 x 10(22) cm(-3), 5.4 cm(2)/Vs, and 7.93 x 10(-5) Omega cm, respectively. Compared with as-deposited SnO2 thin films, these electrical properties are significantly enhanced, and plasmonic effects also occurred due to the presence of Au NPs. The enhanced properties are mainly attributed to generation of oxygen vacancies in SnO2 thin films. Our results demonstrate the potential of using SnO2 thin films as binary system TCOs, and point to the synergistic effects of using MW and Au NPs together.
机译:近年来,透明导电氧化物(TCO)在电子器件和能量收集应用的发展中引起了越来越多的关注。用作TCO的标准材料是掺锡氧化铟(ITO)和掺氟氧化锡(FTO),它们是三元体系,需要掺杂工艺。在这里,我们介绍了在原子层沉积(ALD)法生长的二氧化锡(SnO2)薄膜上同时使用微波(MW)辐射和金纳米颗粒(NPs)的协同效应,该薄膜具有二元体系,不需要任何额外的掺杂过程。为了与沉积态SnO2薄膜进行比较,我们制备了具有和不具有Au-NP装饰的MW辐照SnO2薄膜。在微波辐照过程中添加金纳米粒子的SnO2薄膜的载流子浓度、霍尔迁移率和电阻率分别为1.45 x 10(22)cm(-3)、5.4 cm(2)/Vs和7.93 x 10(-5)Ωcm。与沉积态的SnO2薄膜相比,这些电学性质显著增强,并且由于金纳米粒子的存在,也发生了等离子体效应。其性能的提高主要归因于SnO2薄膜中氧空位的产生。我们的研究结果证明了使用SnO2薄膜作为二元系统TCO的潜力,并指出了同时使用MW和Au NP的协同效应。

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