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Mechanical Behavior of Spin-Coated Sb_2S_3 light Absorption Thin Films

机译:旋转涂层SB_2S_3光吸收薄膜的力学行为

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摘要

To measure the mechanical properties of Sb_2S_3, a two-component compound semiconductor used in the light absorption layer of a solar cell, Sb_2S_3 thin films were formed on FTO glass using the spin coating method. The spin-coated Sb_2S_3 thin films were heat-treated at 200 °C in an Ar atmosphere for up to 1 hour to form a thin film with continuous crystalline structures. A nanoindentation system was used to measure the mechanical properties of the spin-coated Sb_2S_3 thin films, and the phenomena appearing during indentation were analyzed. We used the continuous stiffness measurement (CSM) technique, and Young's modulus and hardness measured with the indentation depth of 250 nm were about 53.1 GPa and 1.43 GPa, respectively. The results were analyzed and compared with literature values, which varied from 40 GPa for the nanowire forms of Sb_2S_3 to 117 GPa, based upon simulation results. Since there are few studies on the mechanical properties of spin-coated Sb_2S_3 thin films, the results of this study are worthwhile. Besides, we observed that the Sb_2S_3 thin film had a little brittleness in the indentation test at higher load, and the microstructure was pushed around the indenter depending on the degree of bonding to the FTO glass substrate. This is a matter to be considered when making flexible devices in the future.
机译:为了测量用于太阳能电池光吸收层的双组分化合物半导体Sb_2S_3的机械性能,采用旋涂法在FTO玻璃上制备了Sb_2S_3薄膜。旋转涂覆的Sb_2S_3薄膜在200°C的Ar气氛中热处理长达1小时,以形成具有连续晶体结构的薄膜。利用纳米压痕系统测量了旋转涂覆的Sb_2S_3薄膜的力学性能,并对压痕过程中出现的现象进行了分析。我们使用了连续刚度测量(CSM)技术,压痕深度为250 nm时测得的杨氏模量和硬度分别约为53.1 GPa和1.43 GPa。根据模拟结果,对结果进行了分析,并与文献值进行了比较,文献值从Sb_2S_3纳米线形式的40GPa到117GPa不等。由于目前对旋涂Sb_2S_3薄膜力学性能的研究较少,本研究的结果是值得的。此外,我们观察到Sb_2S_3薄膜在较高载荷下的压痕试验中有一点脆性,微观结构被压在压头周围,这取决于与FTO玻璃基板的结合程度。这是未来制造柔性设备时需要考虑的问题。

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