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首页> 外文期刊>Diamond and Related Materials >Structural, mechanical and tribological behavior of different DLC films deposited on plasma nitrided CF170 steel
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Structural, mechanical and tribological behavior of different DLC films deposited on plasma nitrided CF170 steel

机译:不同DLC膜的结构,机械和摩擦学行为沉积在等离子体氮化CF170钢上

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摘要

In order to improve the surface hardness and tribological properties of CF170 steel, a duplex treatment including plasma nitriding and deposition of different diamond-like carbon (DLC) films was carried out on CF170 steel. The structural, mechanical and tribological properties of untreated, plasma nitrided and duplex-treated samples were investigated by methods of XRD, SEM, AFM, Raman spectroscopy, XPS, hardness tester, scratch tester and ballon-disc tribometer, respectively. Raman spectroscopy and XPS revealed that the Ti/a-C/(ta-C) film had the highest amount of sp3 content, followed by Cr/WC/(a-C:H) and Cr/WC/(a-C:H:W) films. The hardness of duplextreated samples was significantly higher than that of single plasma nitrided sample and the highest value was obtained from the Ti/a-C/(ta-C) film deposited on the plasma nitrided sample. The critical adhesion load (Lc3) of the Cr/WC/(a-C:H) film deposited on the plasma nitrided sample was obviously higher than that of the Ti/a-C/ (ta-C) film deposited on the plasma nitrided sample. The duplex-treated samples showed a low friction coefficient. Both Cr/WC/(a-C:H) and Ti/a-C/(ta-C) films deposited on plasma nitrided samples had a low wear rate. The wear rate of the Cr/WC/(a-C:H) film deposited on the plasma nitrided sample was reduced by one (five) orders of magnitude compared to the plasma nitride (untreated) sample.
机译:为了提高CF170钢的表面硬度和摩擦学性能,在CF170钢上进行了等离子渗氮和沉积不同类金刚石膜(DLC)的双重处理。采用XRD、SEM、AFM、拉曼光谱、XPS、硬度计、划痕试验机和球盘摩擦磨损试验机分别研究了未经处理、等离子渗氮和双重处理样品的结构、力学和摩擦学性能。拉曼光谱和XPS表明,Ti/a-C/(ta-C)薄膜的sp3含量最高,其次是Cr/WC/(a-C:H)和Cr/WC/(a-C:H:W)薄膜。双重处理样品的硬度显著高于单一等离子渗氮样品的硬度,并且在等离子渗氮样品上沉积的Ti/a-C/(ta-C)膜的硬度值最高。等离子氮化样品上沉积的Cr/WC/(a-C:H)薄膜的临界粘附力(Lc3)明显高于等离子氮化样品上沉积的Ti/a-C/(ta-C)薄膜。经双重处理的样品显示出较低的摩擦系数。等离子氮化样品上沉积的Cr/WC/(a-C:H)和Ti/a-C/(ta-C)薄膜的磨损率都很低。与等离子体氮化(未处理)样品相比,沉积在等离子体氮化样品上的Cr/WC/(a-C:H)薄膜的磨损率降低了一(五)个数量级。

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