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Temperature effects on the electrical characteristics of Al/PTh-SiO2/p-Si structure

机译:对Al / Pth-SiO2 / P-Si结构的电气特性的温度效应

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摘要

The temperature-dependent current-voltage (I -V) and capacitance-voltage (C-V) characteristics of the fabricated Al/p-Si Schottky diodes with the polythiopene-SiO2 nanocomposite (PTh-SiO2) interlayer were investigated. The ideality factor of Al/PTh-SiO2/p-Si Schottky diodes has decreased with increasing temperature and the barrier height has increased with increasing temperature. The change in the barrier height and ideality factor values with temperature was attributed to inhomogeneties of the zero-bias barrier height. Richardson plot has exhibited curved behaviour due to temperature dependence of barrier height. The activation energy and effective Richardson constant were calculated as 0.16 eV and 1.79 x 10(-8) A cm(-2) K-2 from linear part of Richardson plots, respectively. The barrier height values determined from capacitance-voltage-temperature (C-V-T) measurements decrease with increasing temperature on the contrary of barrier height values obtained from I -V-T measurements.
机译:研究了具有聚噻吩-SiO2纳米复合材料(PTH-SiO 2)中间层的制造的Al / P-Si肖特基二极管的温度依赖的电流电压(I -V)和电容 - 电压(C-V)特性。 Al / Pth-SiO2 / P-Si肖特基二极管的理想因子随着温度的增加而降低,并且屏障高度随着温度的增加而增加。 具有温度的阻挡高度和理想因子值的变化归因于零偏置屏障高度的偏离。 Richardson Plot由于屏障高度的温度依赖而表现出弯曲行为。 激活能量和有效的Richardson常数分别从Richardson Plot的线性部分计算为0.16eV和1.79×10(-8)厘米(-2)k-2。 从电容 - 电压 - 温度(C-V-T)测量确定的屏障高度值随着从I-V-T测量获得的阻挡高度值的相反的温度而降低。

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