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首页> 外文期刊>Applied Catalysis, B. Environmental: An International Journal Devoted to Catalytic Science and Its Applications >Optimization of active surface area of flower like MoS2 using V-doping towards enhanced hydrogen evolution reaction in acidic and basic medium
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Optimization of active surface area of flower like MoS2 using V-doping towards enhanced hydrogen evolution reaction in acidic and basic medium

机译:用V掺杂朝酸性和基础培养基中增强氢进化反应的V-掺杂,优化诸如MOS2的活性表面积。

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摘要

Two dimensional layered transition metal dichalcogenides (TMDS) have immense potential as inexpensive electro-catalyst for hydrogen evolution reaction (HER). Modification of crystal and electronic structure is a promising strategy to enhance the catalytic performance of TMDS. Herein, a colloquial solvothermal method was used to prepare the vanadium (V) doped MoS2 (VMSd). The structural, morphological and chemical analysis confirmed the formation of highly pure and uniform VMSd nanoflower. Tuning of V content in MoS2 successively improved its catalytic activity towards hydrogen evolution reaction (HER). As, evident from the polarization curve, the VMSd required low overpotential of 194 and 206 mV to achieve benchmarking current density of 10 mA cm(-2) in acidic and basic medium, respectively. Mott-Schottky analysis suggested that the flat band potential of MoS2 differed upon V-doping, resulting in alteration of charge transfer ability at the electrode-electrolyte interface. The Fermi level shifted towards the conduction band with optimized V-doping and the band structure got modified effectively.
机译:二维层状过渡金属二均硅烷(TMDS)具有巨大的电势,作为氢化反应(她)的廉价电催化剂。晶体和电子结构的改性是提高TMDS催化性能的有希望的策略。在此,使用一种口腔溶剂质方法制备钒(V)掺杂MOS2(VMSD)。结构,形态学和化学分析证实了高纯净和均匀的VMSD纳米λ的形成。在MOS2中的V含量调节依次改善其催化活性朝向氢进化反应(她)。从偏振曲线中明显看出,VMSD需要低于194和206mV的低调,以分别在酸性和基本介质中实现10 mA cm(-2)的基准测试。 Mott-Schottky分析表明MOS2的扁平带电位在V型掺杂时不同,导致电极电解质界面处的电荷转移能力的改变。通过优化的V掺杂,FERMI水平朝向导电带偏移,频带结构有效地修改。

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