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Determination of trace elements in high-purity quartz samples by ICP-OES and ICP-MS: A normal-pressure digestion pretreatment method for eliminating unfavorable substrate Si

机译:ICP-OES和ICP-MS测定高纯度石英样品中的痕量元素:一种常压消化预处理方法,用于消除不利的底物Si

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The analysis of siliceous matrix samples may adopt a two-step pretreatment, which includes melting with ammonium hydrogen fluoride and redissolving with nitric acid. However, the residual of substrate silicon unfavorable to the determination of trace elements in the samples due to serious matrix effects. Here, a new digestion method using simultaneously both ammonium bifluoride and nitric acid under normal pressure was developed for high-purity quartz sand sample. The digestion pretreatment is a two step process: melting/dissolving with both ammonium bifluoride and nitric acid at 200 degrees C for 2 h, and evaporating the solution at 250 degrees C to dryness. As confirmed by XRD analysis, silicates in the sample were converted to (NH4)(3)SiF6NO3 in the melting/dissolving step. TGA analysis shows that the generated (NH4)(3)SiF6NO3 could be decomposed and evaporated completely at 250 degrees C, which ensured a complete removal of silicon by the followed evaporation of the solution at 250 degrees C. As a result, the followed ICP-OES and ICP-MS analysis needed a solution dilution of only 100 times for the determination of Ca, Mg, Al, Rb, Ba, REE and other trace elements. The new method was applied to the analysis of three certified reference materials, and the results were well consistent with the standard value with RSD% values between 0.62% and 9.73%. Therefore, this method can be applied to the analysis of trace elements in high purity silica-based samples, with the advantages of time-saving, small dilution factor (only 100 times) and low detection limit. (C) 2020 Elsevier B.V. All rights reserved.
机译:硅质基质样品的分析可以采用两步预处理,其包括熔融氟化铵和用硝酸重新溶解。然而,由于严重的基质效应,衬底硅的残留物不利于测定样品中的微量元素。这里,为高纯度石英砂样品开发了一种新的消化方法,同时使用双氟化铵和硝酸在正常压力下。消化预处理是两个步骤方法:将双氟化铵和硝酸在200℃下熔化/溶解2小时,并以250℃蒸发溶液至干。如XRD分析证实,将样品中的硅酸盐转化为熔化/溶解步骤中的(NH 4)(3)SIF6NO 3。 TGA分析表明,所产生的(NH 4)(3)SIF6NO3可以在250℃下完全分解和蒸发,通过在250℃下溶液的溶液完全蒸发完全除去硅。结果,遵循的ICP -OPE和ICP-MS分析需要溶液稀释仅需100次,用于测定Ca,Mg,Al,Rb,Ba,Ree和其他微量元素。将新方法应用于三种认证参考材料的分析,结果良好,标准值符合RSD%值0.62%和9.73%。因此,该方法可以应用于高纯度二氧化硅基样品中的微量元素的分析,具有节省时间,小稀释因子(仅100次)和低检测极限。 (c)2020 Elsevier B.V.保留所有权利。

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