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Monitoring the On-Surface Synthesis of Graphene Nanoribbons by Mass Spectrometry

机译:通过质谱监测石墨烯纳米波纹的表面合成

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摘要

We present a mass spectrometric approach to characterize and monitor the intermediates of graphene nanoribbon (GNR) formation by chemical vapor deposition (CVD) on top of Au(111) surfaces. Information regarding the repeating units, lengths, and termini can be obtained directly from the surface sample by a modified matrix-assisted laser desorption/ionization (MALDI) method. The mass spectrometric results reveal ample oxidative side reactions under CVD conditions that can be drastically diminished by the introduction of protective H-2 gas at ambient pressure. Simultaneously, the addition of hydrogen extends the lengths of the oligophenylenes and thus the final GNRs. Moreover, the prematurely formed cyclodehydrogenation products during the oligomer growth can be assigned by the mass spectrometric technique. The obtained mechanistic insights provide valuable information for optimizing and upscaling the bottom -up fabrication of GNRs. Given the important role of GNRs as semiconductors, the mass spectrometric analysis provides a readily available tool to characterize and improve their structural perfection.
机译:我们提出了一种质谱方法来表征和监测通过化学气相沉积(CVD)在Au(111)表面顶部的化学气相沉积(CVD)的中间体。关于重复单元,长度和末端的信息可以通过改进的基质辅助激光解吸/电离(MALDI)方法直接从表面样品获得。质谱结果在CVD条件下揭示了充足的氧化副反应,其通过在环境压力下引入保护性H-2气体可以急剧下降。同时,加入氢延伸寡缩蛋白的长度,从而延长了最终的GNR。此外,可以通过质谱技术分配在低聚物生长期间过早形成的环氢化产物。所获得的机械洞察力提供了有价值的信息,用于优化和升高GNR的底部制造。鉴于GNR作为半导体的重要作用,质谱分析提供了一种易于使用的工具来表征和改善其结构完美。

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  • 来源
    《Analytical chemistry》 |2017年第14期|共8页
  • 作者单位

    Max Planck Inst Polymer Res Ackermannweg 10 D-55128 Mainz Germany;

    Max Planck Inst Polymer Res Ackermannweg 10 D-55128 Mainz Germany;

    Max Planck Inst Polymer Res Ackermannweg 10 D-55128 Mainz Germany;

    Max Planck Inst Polymer Res Ackermannweg 10 D-55128 Mainz Germany;

    Tech Univ Dresden Ctr Adv Elect Dresden Cfaed Mommsenstr 4 D-01062 Dresden Germany;

    Max Planck Inst Polymer Res Ackermannweg 10 D-55128 Mainz Germany;

    Empa Swiss Fed Labs Mat Sci &

    Technol CH-8600 Dubendorf Switzerland;

    Empa Swiss Fed Labs Mat Sci &

    Technol CH-8600 Dubendorf Switzerland;

    Empa Swiss Fed Labs Mat Sci &

    Technol CH-8600 Dubendorf Switzerland;

    Tech Univ Dresden Ctr Adv Elect Dresden Cfaed Mommsenstr 4 D-01062 Dresden Germany;

    Max Planck Inst Polymer Res Ackermannweg 10 D-55128 Mainz Germany;

    Max Planck Inst Polymer Res Ackermannweg 10 D-55128 Mainz Germany;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 分析化学;
  • 关键词

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