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Depth-Profiling Microanalysis of CoNCN Water-Oxidation Catalyst Using a lambda=46.9 nm Plasma Laser for Nano-Ionization Mass Spectrometry

机译:使用Lambda = 46.9nm等离子体激光器进行纳米电离质谱法的深度谱分析微基分析

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摘要

Nanoscale depth profiling analysis of a CoNCN-coated electrode for water oxidation catalysis was carried out using table-top extreme ultraviolet (XUV) laser ablation time-of-flight mass spectrometry. The self-developed laser operates at lambda = 46.9 nm and represents factor of 4 reduction in wavelength with respect to the 193 nm excimer laser. The reduction of the wavelength is an alternative approach to the reduction of the pulse duration, to enhance the ablation characteristics and obtain smaller quasi-nondestructive ablation pits. Such a XUV-laser ablation method allowed distinguishing different composite components of the catalyst-Nafion blend, used to modify a screen-printed carbon electrode surface. Chemical information was extracted by fragment assignment and relative amplitude analysis of the mass spectrometry peaks. Pure Nafion and the exposed carbon substrate were compared as references. Material specific fragments were clearly identified by the detected nonoverlapping mass-to-charge peaks of Nafion and CoNCN. Three dimensional mapping of relevant mass peak amplitudes was used to determine the lateral distribution and to generate depth profiles from consecutive laser pulses. Evaluating the profiles of pristine electrodes gave insight into fragmentation behavior of the catalyst in a functional ionomer matrix and comparison of post-catalytic electrodes revealed spots of thin localized Co residues.
机译:使用台式极端紫外(XUV)激光消融飞行时间质谱法进行水氧化催化的纳米级深度涂布电极的纳米级深度分析。自发光的激光在Lambda = 46.9nm处运行,并且相对于193nm准分子激光器表示波长的4个因子4。波长的减小是减少脉冲持续时间的替代方法,以增强消融特性并获得较小的准无损消融凹坑。这种XUV激光烧蚀方法允许区分催化剂Nafion混合物的不同复合组分,用于改变丝网印刷的碳电极表面。通过分段分配和质谱峰的相对幅度分析提取化学信息。将纯Nafion和暴露的碳衬底与参考文献进行比较。通过检测到的Nafion和CONCN的未检测到的QUACION-FIRGET峰清楚地鉴定了材料特异性片段。使用相关质量峰幅度的三维映射用于确定横向分布,并从连续的激光脉冲产生深度分布。评价原始电极的谱使催化剂在官能离子基质中的碎片行为洞察,并且催化剂后电极的比较揭示了薄型局部CO残基的斑点。

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  • 来源
    《Analytical chemistry》 |2018年第15期|共7页
  • 作者单位

    Univ Zurich Dept Chem Winterthurerstr 190 CH-8057 Zurich Switzerland;

    Colorado State Univ NSF Ctr Extreme Ultraviolet Sci &

    Technol Ft Collins CO 80523 USA;

    Swiss Fed Labs Mat Sci &

    Technol EMPA Uberlandstr 129 CH-8600 Dubendorf Switzerland;

    Swiss Fed Labs Mat Sci &

    Technol EMPA Uberlandstr 129 CH-8600 Dubendorf Switzerland;

    Colorado State Univ NSF Ctr Extreme Ultraviolet Sci &

    Technol Ft Collins CO 80523 USA;

    Univ Zurich Dept Chem Winterthurerstr 190 CH-8057 Zurich Switzerland;

    Univ Zurich Dept Chem Winterthurerstr 190 CH-8057 Zurich Switzerland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 分析化学;
  • 关键词

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