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首页> 外文期刊>ACS applied materials & interfaces >Effects of Ni and Cu Antisite Substitution on the Phase Stability of CuGa2 from Liquid Ga/Cu-Ni Interfacial Reaction
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Effects of Ni and Cu Antisite Substitution on the Phase Stability of CuGa2 from Liquid Ga/Cu-Ni Interfacial Reaction

机译:Ni和Cu Arisite取代对液态GA / Cu-Ni界面反应Cuga2相位稳定性的影响

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摘要

Ga and Ga-based alloys have received significant attention for applications in the liquid state and also for their potential as a bonding material in microelectronic assemblies. This study investigates the phase stability of the CuGa(2 )phase as a product of the interfacial reaction between liquid Ga and Cu-10Ni substrates at room temperature. In the binary Ga-Cu system, CuGa2 is decomposed into liquid Ga and Cu9Ga4 as the temperature increases to around 260 degrees C, which prevents the widespread application of this alloy. In contrast to CuGa2 grown from a pure Cu substrate, CuGa2 from the Cu-10Ni substrate shows an increase in the decomposition temperature during heating from 25 to 300 degrees C. According to our first-principle calculations, there is only a minor difference in the total free energy between Ni solute at the Cu sublattice and the Ga sublattice in the tetragonal CuGa2 crystal structure. This result indicates that both of the sublattices can accommodate the dilute Ni solute with comparable probability. Regardless of the sublattice where the Ni impurities are located, the presence of diluted Ni in the matrix stabilizes the CuGa2 system by inducing some localized Ni(3)d states at energy levels near the Fermi level. It is also shown that the formation of Cu antisite defects, which also stabilizes CuGa2, is preferable if the CuGa2 matrix is grown on a Nicontaining substrate.
机译:Ga和Ga基合金已经接受了液态中的应用的显着关注,并且其作为微电子组件中的粘合材料的潜力。该研究研究了Cuga(2)相的相位稳定性作为液体GA和Cu-10Ni基材之间的界面反应的产物。在二元GA-Cu系统中,Cuga2分解成液态Ga和Cu9Ga4,因为温度升高到260℃,这防止了这种合金的广泛应用。与从纯Cu衬底生长的Cuga2相反,来自Cu-10Ni底物的Cuga2显示出在加热期间的分解温度增加到25至300摄氏度。根据我们的第一原理计算,只有一个微小的差异在Cu子叶的Ni溶质之间的总自由能和四边形Cuga2晶体结构中的GA子晶胞。该结果表明,两种子图示都可以以相当的概率容纳稀释Ni溶质。无论是否定位Ni杂质的子斑,基质中稀释的Ni的存在稳定Cuga2系统,通过在费米水平附近的能量水平下诱导一些局部的Ni(3)D状态。还表明,如果Cuga2基质在尼阳塔基壳上生长,则优选形成Cu Antisite缺陷的形成。

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