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Lightweight and flexible graphene/SiC-nanowires/poly(vinylidene fluoride) composites for electromagnetic interference shielding and thermal management

机译:轻质和柔韧的石墨烯/ SiC纳米线/聚(偏二氟乙烯)复合材料,用于电磁干扰屏蔽和热管理

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Lightweight and flexible ternary composites with graphene (Gn), silicon carbide nanowires (SiCnw), and poly (vinylidene fluoride) (PVDF) matrix were successfully fabricated via electrostatic assembly and solution casting followed by hot-pressing. The synergism of two-dimensional Gn and one-dimensional SiCnw with stacking fault structure improved the formation of conductive paths and multiple interfaces. This enhanced the dielectric properties, electromagnetic interference (EMI) shielding and thermal conduction performance of the fabricated composites. For instance, by the incorporation of 9.5 wt % Gn-SiCnw, the dielectric constant and the dielectric loss of the composites were increased by 4 orders of magnitude compared with neat PVDF. A maximum EMI shielding effectiveness (SE) of 32.5 dB was achieved for the composites at 1.2mm thickness in the frequency range 8.2-12.4 GHz. The high EMI SE of the Gn-SiCnw/PVDF can be attributed to the high electrical conductivity, dielectric constant and dielectric loss. The composites also showed a high thermal conductivity of 2.13W. m(-1). K-1, due to the formation of a thermally conductive network between Gn and SiCnw. This dual functionality of the Gn-SiCnw/PVDF composites demonstrates that they are outstanding materials with potential applications in EMI shielding and thermal management for microelectronics. (C) 2019 Elsevier Ltd. All rights reserved.
机译:通过静电组件和溶液铸件成功制造了具有石墨烯(GN),碳化硅纳米线(SICNW)和聚(偏二氟乙烯)基质的轻质和柔性的三元组合材料,然后通过静电组件和溶液浇铸进行热压。具有堆叠故障结构的二维GN和一维SiCNW的协同作用改善了导电路径的形成和多个接口。这改变了制造复合材料的电介质特性,电磁干扰(EMI)屏蔽和热传导性能。例如,通过掺入9.5wt%GN-SiCNW,与整齐PVDF相比,复合材料的介电常数和复合材料的介电损耗增加了4个级。在频率范围为8.2-12.4 GHz的频率范围内为1.2mm厚度的复合材料实现了32.5dB的最大EMI屏蔽效果(SE)。 GN-SICNW / PVDF的高EMI SE可以归因于高导电性,介电常数和介电损耗。复合材料还显示出2.13W的高导热率。 m(-1)。 K-1,由于GN和SICNW之间的导热网络形成。 GN-SICNW / PVDF复合材料的这种双重功能表明,它们是具有EMI屏蔽和微电子热管理中的潜在应用的卓越材料。 (c)2019年elestvier有限公司保留所有权利。

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