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Growth of silicon carbide nanotubes in arc plasma treated silicon carbide grains and their microstructural characterizations

机译:弧等离子体处理碳化硅颗粒中碳化硅纳米管的生长及其微观结构特征

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Silicon carbide nanotubes were found to grow in straight as well as curved configurations by treating silicon carbide grains in an arc plasma reactor/furnace followed by 3 h of cooling (in air). By increasing the plasma treatment time from 16 min to 20 min, multi-wall tubes were found to change to single wall tubes with reduction in diameter from few nm to sub-nm. Typical in situ grown nanotubes were characterized by XRD, TEM, SAED, HRTEM, EDS and micro Raman spectroscopy, and it is established from these evaluations that the nanotubes are made up of silicon carbide and not carbon. A possible mechanism, involving reaction between the plasma dissociated carbon (solid) forming carbon nanotube and the left-out silicon (existing in vapour state) during the cooling period (3000-2680 degrees C), is suggested to be responsible for silicon carbide nanotube formation in the plasma assisted process.
机译:发现碳化硅纳米管通过在电弧等离子体反应器/炉中处理碳化硅颗粒,然后在弧形等离子体反应器/炉中处理3小时(在空气中),碳化硅纳米管和弯曲构型。 通过将血浆处理时间从16分钟增加到20分钟,发现多壁管改变为单壁管,其直径减少到亚NM。 通过XRD,TEM,SAED,HRTEM,EDS和微拉曼光谱表征典型的原位生长纳米管,并且从这些评价中建立了纳米管由碳化硅和不碳构成的评价。 在冷却时段(3000-2680℃)期间,涉及形成碳纳米管的等离子体离解碳(固体)和左输出硅(存在于蒸汽状态)之间的可能机理(3000-2680℃)。负责碳化硅纳米管 在等离子体辅助过程中形成。

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