首页> 外文期刊>CERAMICS INTERNATIONAL >Deposition mechanisms of yttria-stabilized zirconia coatings during plasma spray physical vapor deposition
【24h】

Deposition mechanisms of yttria-stabilized zirconia coatings during plasma spray physical vapor deposition

机译:等离子体喷雾物理气相沉积期间氧化钇稳定的氧化锆涂层的沉积机制

获取原文
获取原文并翻译 | 示例
           

摘要

As a new processing technology, plasma spray physical vapor deposition (PS-PVD) offers the possibilities to deposit coatings with microstructures varied in a wide range, including fully dense structure, columnar structure and hybrid structure. In this paper, the deposition mechanisms related to the above three microstructures were investigated by looking into the morphologies and phase compositions of the initial deposits during several seconds spraying. The dense coating was stacked up mainly by liquid droplets, un-melted/semi-melted particles and vapor phases. The columnar coating was mostly deposited from vapor phases which were transported to the substrate surface in the state of vapor atoms and clusters, growing in a new growth mechanism different from that in EB-PVD process. The hybrid coating was formed by co-deposition of vapor phases and liquid droplets. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:作为一种新的加工技术,等离子体喷雾物理气相沉积(PS-PVD)提供了沉积涂层的可能性,在宽范围内具有变化的微观结构,包括完全致密的结构,柱状结构和混合结构。 在本文中,通过调查在几秒钟喷射期间初始沉积物的形态和相组合物来研究与上述三种微观结构相关的沉积机制。 致密涂层主要由液滴,未熔化/半熔化的颗粒和蒸汽相堆叠。 柱状涂层大部分沉积从蒸汽相沉积,所述蒸汽相管在蒸气原子和簇的状态下运输到基材表面,在新的生长机制中生长与EB-PVD工艺不同。 通过蒸汽相和液滴共沉积形成杂化涂层。 (c)2015 Elsevier Ltd和Techna Group S.R.L. 版权所有。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号