Analysis for arbitrary shaped grating by FDTD method -near field to far field transformation

摘要

Lithography for diffractive optical elements will make it possible to process minute elements in future. Elements to wavelength ratio is not analysis by using the scalar diffraction analysis. Diffracting efficiency from doubly periodic grating is analyzed by using the FDTD method. In this analysis, 3D arbitrary shaped grating can be treated. A method for the near to far field transformation is proposed. The results by this method are compared with the results by T-matrix method.